Metal-induced solid-phase crystallization of hydrogenated amorphous silicon: dependence on metal type and annealing temperature

2000 ◽  
Vol 70 (5) ◽  
pp. 587-590 ◽  
Author(s):  
Y.Z. Wang ◽  
O.O. Awadelkarim
2006 ◽  
Vol 89 (16) ◽  
pp. 161910 ◽  
Author(s):  
David L. Young ◽  
Paul Stradins ◽  
Yueqin Xu ◽  
Lynn Gedvilas ◽  
Bob Reedy ◽  
...  

2006 ◽  
Vol 89 (12) ◽  
pp. 121921 ◽  
Author(s):  
P. Stradins ◽  
D. L. Young ◽  
Y. Yan ◽  
E. Iwaniczko ◽  
Y. Xu ◽  
...  

1991 ◽  
Vol 219 ◽  
Author(s):  
Gaorong Han ◽  
Jianmin Qiao ◽  
Piyi Du ◽  
Zhonghua Jiang ◽  
Zishang Ding

ABSTRACTWe have presented ESR and PAS measurements for a series of a-SiS:H and a-Si: H films deposited by glow discharge at different parameters. The spin density in a-SiS:H alloys measured by ESR is essentially independent of the sulphur content, while the density of defects measured by PAS increases significantly with the increasing of sulphur content. The ESR signals in a-SiS:H alloys strongly depend on both annealing and illumination. The spin density increases up to 540°C and then decreases with raising annealing temperature for a-SiS:H and a-Si:H alloys. The results suggest that some new defects such as molecular hydrogen and microvoids are appeared when addition of sulphur to a-Si:H films.


2014 ◽  
Vol 568 ◽  
pp. 38-43 ◽  
Author(s):  
J.M. Westra ◽  
R.A.C.M.M. van Swaaij ◽  
P. Šutta ◽  
K. Sharma ◽  
M. Creatore ◽  
...  

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