Electrical characteristics of atomic layer deposited Au/Ti/HfO2/n-GaAs MIS diodes in the wide temperature range
2020 ◽
Vol 31
(10)
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pp. 7839-7849
2011 ◽
Vol 509
(16)
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pp. 5105-5111
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2009 ◽
Vol 509
(1)
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pp. 363/[1105]-377/[1119]
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1987 ◽
Vol 134
(5)
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pp. 291
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2018 ◽
Vol 10
(6)
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pp. 06046-1-06046-4
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Keyword(s):
Keyword(s):