Improved performance on seizure detection in an automated electroencephalogram signal under evolution by extracting entropy feature

Author(s):  
Revathi Munirathinam ◽  
Suresh Ponnan ◽  
Chinmay Chakraborty ◽  
Saravanakumar Umathurai
2019 ◽  
Vol 12 (3) ◽  
pp. 1543-1553 ◽  
Author(s):  
Varsha Harpale ◽  
Vinayak Bairagi

Epilepsy is a brain disorder which produces recurrent seizures as a storm of the electrical activity of the brain. 70 millions of people living with epilepsy in the world and most of them are from developing countries and near about 12 millions of people are residing from India. In rural areas, seizure disorder is not treated seriously so there is a need for awareness and availability of proper medication. Recurring seizures are the major source of diagnosis of epilepsy so real-time prediction using analytical methods is a need of the research in this area. Electroencephalographic (EEG) signals are the rich source of the early diagnosis of epilepsy. The basic objective of the work is to proposed real time architecture which could be included in existing EEG monitoring and measuring instruments to mark the seizure occurrence. This will facilitate medical practitioners monitoring primary status of patients and understanding frequency of seizure occurrence. Thus the proposed work provide real-time architecture or improved performance reconfigurable solution to contribute in designing real-time seizure detection system. The EEG processing architecture is designed and implemented in this work, which will add values to the existing EEG monitoring and recording system.


2020 ◽  
Vol 32 ◽  
pp. 02008
Author(s):  
Meenal Vijay Kakade ◽  
Chandrakant J. Gaikwad ◽  
Vijay R. Dahake

The use of computer aided diagnosis systems for disease identifiscation, based on signal processing, image processing and video processing terminologies is common due to emerging technologies in medical field. The detection of epilepsy seizures using EEG recordings is done by different signal processing techniques. To reduce the disability caused by the uncertainty of the occurrence of seizures, a recording system which shall result accurate and early detection of seizure with quick warning is greatly desired. To optimize the performance of EEG based epilepsy seizures detection, in this work we are presenting a method based on two key algorithms. Here, we propose unique algorithm based on SWT (Stationary Wavelet Transform), for easier seizure analysis process, along with improved performance of the application of seizure detection algorithms. Then, we propose the algorithm for feature extraction that makes use of Higher Order Statistics of the coefficients that are calculated using Wavelet Packet Decomposition (WPD).This helps in improving the epilepsy seizures detection performance. The proposed methods helps to improve the overall efficiency and robustness of EEG based epilepsy seizures detection system.


Author(s):  
Gertrude. F. Rempfer

Optimum performance in electron and ion imaging instruments, such as electron microscopes and probe-forming instruments, in most cases depends on a compromise either between imaging errors due to spherical and chromatic aberrations and the diffraction error or between the imaging errors and the current in the image. These compromises result in the use of very small angular apertures. Reducing the spherical and chromatic aberration coefficients would permit the use of larger apertures with resulting improved performance, granted that other problems such as incorrect operation of the instrument or spurious disturbances do not interfere. One approach to correcting aberrations which has been investigated extensively is through the use of multipole electric and magnetic fields. Another approach involves the use of foil windows. However, a practical system for correcting spherical and chromatic aberration is not yet available.Our approach to correction of spherical and chromatic aberration makes use of an electrostatic electron mirror. Early studies of the properties of electron mirrors were done by Recknagel. More recently my colleagues and I have studied the properties of the hyperbolic electron mirror as a function of the ratio of accelerating voltage to mirror voltage. The spherical and chromatic aberration coefficients of the mirror are of opposite sign (overcorrected) from those of electron lenses (undercorrected). This important property invites one to find a way to incorporate a correcting mirror in an electron microscope. Unfortunately, the parts of the beam heading toward and away from the mirror must be separated. A transverse magnetic field can separate the beams, but in general the deflection aberrations degrade the image. The key to avoiding the detrimental effects of deflection aberrations is to have deflections take place at image planes. Our separating system is shown in Fig. 1. Deflections take place at the separating magnet and also at two additional magnetic deflectors. The uncorrected magnified image formed by the objective lens is focused in the first deflector, and relay lenses transfer the image to the separating magnet. The interface lens and the hyperbolic mirror acting in zoom fashion return the corrected image to the separating magnet, and the second set of relay lenses transfers the image to the final deflector, where the beam is deflected onto the projection axis.


TAPPI Journal ◽  
2016 ◽  
Vol 15 (9) ◽  
pp. 581-586 ◽  
Author(s):  
RICARDO B. SANTOS ◽  
PETER W. HART ◽  
DOUGLAS C. PRYKE ◽  
JOHN VANDERHEIDE

The WestRock mill in Covington, VA, USA, initiated a long term diagnostic and optimization program for all three of its bleaching lines. Benchmarking studies were used to help identify optimization opportunities. Capital expenditures for mixing improvement, filtrate changes, equipment repair, other equipment changes, and species changes were outside the scope of this work. This focus of this paper is the B line, producing southern hardwood pulp in a D(EP)DD sequence at 88% GE brightness. The benchmarking study and optimization work identified the following opportunities for improved performance: nonoptimal addition of caustic and hydrogen peroxide to the (EP) stage, carryover of D0 filtrate to the (EP) stage, and carryover of (EP) filtrate to the D1 stage. As a result of actions the mill undertook to address these opportunities, D0 kappa factor decreased about 5%, sodium hydroxide consumption in the (EP) stage decreased about 35%, chlorine dioxide consumption in the D1 stage decreased about 25%, and overall bleaching cost decreased about 15%.


2015 ◽  
Vol 135 (12) ◽  
pp. 1237-1238
Author(s):  
Yasuhiko Neba ◽  
Hirokazu Matsumoto ◽  
Yuta Kawasaki

2011 ◽  
Author(s):  
Chay Yoeng Chung ◽  
Ahmad Hakam Abdul Razak ◽  
Ming Zo Tan ◽  
Sharp Ugwuocha ◽  
Eric Twardowski ◽  
...  

2018 ◽  
Author(s):  
Suresh Natarajan ◽  
Cara-Lena Nies ◽  
Michael Nolan

<div>As the critical dimensions of transistors continue to be scaled down to facilitate improved performance and device speeds, new ultrathin materials that combine diffusion barrier and seed/liner properties are needed for copper interconnects at these length scales. Ideally, to facilitate coating of high aspect ratio structures, this alternative barrier+liner material should only consist of one or as few layers as possible. We studied TaN, the current industry standard for Cu diffusion barriers, and Ru, which is a</div><div>suitable liner material for Cu electroplating, to explore how combining these two materials in a barrier+liner material influences the adsorption of Cu atoms in the early stage of Cu film growth. To this end, we carried out first-principles simulations of the adsorption and diffusion of Cu adatoms at Ru-passivated and Ru-doped e-TaN(1 1 0) surfaces. For comparison, we also studied the behaviour of Cu and Ru adatoms at the low index surfaces of e-TaN, as well as the interaction of Cu adatoms with the (0 0 1) surface of hexagonal Ru. Our results confirm the barrier and liner properties of TaN and Ru, respectively while also highlighting the weaknesses of both materials. Ru passivated TaN was found to have improved binding with Cu adatoms as compared to the bare TaN and Ru surfaces.</div><div>On the other hand, the energetic barrier for Cu diffusion at Ru passivated TaN surface was lower than at the bare TaN surface which can promote Cu agglomeration. For Ru-doped TaN however, a decrease in Cu binding energy was found in addition to favourable migration of the Cu adatoms toward the doped Ru atom and unfavourable migration away from it or into the bulk. This suggests that Ru doping sites in the TaN surface can act as nucleation points for Cu growth with high migration barrier preventing agglomeration and allow electroplating of Cu. Therefore Ru-doped TaN is proposed as a candidate for a combined barrier+liner material with reduced thickness.</div>


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