Effect of Duty Cycle on Characteristics of CrNxThin Films Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb08 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB08 ◽

Author(s):

Chi-Lung Chang ◽

Bo-Yi Wu ◽

Pin-Hung Chen ◽

Wei-Chih Chen ◽

Chun-Ta Ho ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Epitaxial Growth of CaMnO 3– y Films on LaAlO 3 (112¯0) by Pulsed Direct Current Reactive Magnetron Sputtering

physica status solidi (RRL) - Rapid Research Letters ◽

10.1002/pssr.202100504 ◽

2022 ◽

pp. 2100504

Author(s):

Erik Ekström ◽

Anna Elsukova ◽

Justine Grasland ◽

Justinas Palisaitis ◽

Ganpati Ramanath ◽

...

Keyword(s):

Magnetron Sputtering ◽

Epitaxial Growth ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Optimization on Deposition of Aluminum Nitride by Pulsed Direct Current Reactive Magnetron Sputtering

2020 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic49141.2020.9282480 ◽

2020 ◽

Author(s):

Yu-Pu Yang ◽

Te-Yun Lu ◽

Song-Ho Wang ◽

Hsueh-Er Chang ◽

Peter j. Wang ◽

...

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641049 ◽

2004 ◽

Vol 22 (2) ◽

pp. 260-263 ◽

Author(s):

Jung W. Lee ◽

Jerome J. Cuomo ◽

Mohamed Bourham

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Plasma Characteristics ◽

Pulsed Direct Current

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The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

Journal of Electronic Materials ◽

10.1007/s11664-005-0155-9 ◽

2005 ◽

Vol 34 (12) ◽

pp. 1484-1492 ◽

Author(s):

Jyh-Wei Lee ◽

Shih-Kang Tien ◽

Yu-Chu Kuo

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Direct Current ◽

Pulse Frequency ◽

Reactive Magnetron Sputtering ◽

Chromium Nitride ◽

Substrate Bias ◽

Reactive Magnetron ◽

Nitride Coatings ◽

Pulsed Direct Current

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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582059 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3317-3321 ◽

Author(s):

V. Vancoppenolle ◽

P.-Y. Jouan ◽

M. Wautelet ◽

J.-P. Dauchot ◽

M. Hecq

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Glow Discharge Mass Spectrometry ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Mass Spectrometry Study

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Effects of Rapid Thermal Processing on Microstructure and Optical Properties of As-Deposited Ag 2 O Films by Direct-Current Reactive Magnetron Sputtering

Chinese Physics Letters ◽

10.1088/0256-307x/27/2/026804 ◽

2010 ◽

Vol 27 (2) ◽

pp. 026804 ◽

Author(s):

Gao Xiao-Yong ◽

Feng Hong-Liang ◽

Zhang Zeng-Yuan ◽

Ma Jiao-Min ◽

Lu Jing-Xiao

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

Thermal Processing ◽

Rapid Thermal Processing ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Structural and ferroelectric properties of bismuth ferrite thin films deposited by direct current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.10.035 ◽

2016 ◽

Vol 601 ◽

pp. 106-110 ◽

Author(s):

Aleksandras Iljinas ◽

Vytautas Stankus

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Bismuth Ferrite ◽

Ferroelectric Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Ferrite Thin Films

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Fabrication of low phase transition temperature vanadium oxide films by direct current reactive magnetron sputtering and oxidation post-anneal method

Infrared Physics & Technology ◽

10.1016/j.infrared.2014.07.016 ◽

2014 ◽

Vol 67 ◽

pp. 126-130 ◽

Author(s):

Ya Qiao ◽

Jie Chen ◽

Yuan Lu ◽

Xing Yang ◽

Hua Yang ◽

...

Keyword(s):

Phase Transition ◽

Transition Temperature ◽

Magnetron Sputtering ◽

Vanadium Oxide ◽

Phase Transition Temperature ◽

Direct Current ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Vanadium Oxide Films

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Study on the Crystalline Structure and Thermal Stability of Silver Oxide Films Deposited by Direct-Current Reactive Magnetron Sputtering Methods

Journal of the Korean Physical Society ◽

10.3938/jkps.56.1176 ◽

2010 ◽

Vol 56 (4) ◽

pp. 1176-1179 ◽

Author(s):

Xiaoyong Gao ◽

Hong-Liang Feng ◽

Zeng-Yuan Zhang ◽

Jiao-Min Ma

Keyword(s):

Thermal Stability ◽

Magnetron Sputtering ◽

Crystalline Structure ◽

Direct Current ◽

Silver Oxide ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Thermal Stability Of

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Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films

Thin Solid Films ◽

10.1016/j.tsf.2004.06.159 ◽

2005 ◽

Vol 473 (1) ◽

pp. 58-62 ◽

Author(s):

Ruijin Hong ◽

Hongji Qi ◽

Jianbing Huang ◽

Hongbo He ◽

Zhengxiu Fan ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron

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