Preparation, electrical properties and optical characterization of Cd2SnO4 and CdIn2O4 thin films as transparent and conductive coatings

1987 ◽  
Vol 153 (1-3) ◽  
pp. 479-486 ◽  
Author(s):  
T. Pisarkiewicz ◽  
K. Zakrzewska ◽  
E. Leja
2013 ◽  
Vol 665 ◽  
pp. 254-262 ◽  
Author(s):  
J.R. Rathod ◽  
Haresh S. Patel ◽  
K.D. Patel ◽  
V.M. Pathak

Group II-VI compounds have been investigated largely in last two decades due to their interesting optoelectronic properties. ZnTe, a member of this family, possesses a bandgap around 2.26eV. This material is now a day investigated in thin film form due to its potential towards various viable applications. In this paper, the authors report their investigations on the preparation of ZnTe thin films using vacuum evaporation technique and their structural and optical characterizations. The structural characterization, carried out using an X-ray diffraction (XRD) technique shows that ZnTe used in present case possesses a cubic structure. Using the same data, the micro strain and dislocation density were evaluated and found to be around 1.465×10-3lines-m2and 1.639×1015lines/m2respecctively. The optical characterization carried out in UV-VIS-NIR region reveals the fact that band gap of ZnTe is around 2.2eV in present case. In addition to this, it was observed that the value of bandgap decreases as the thickness of films increases. The direct transitions of the carries are involved in ZnTe. Using the data of UV-VIS-NIR spectroscopy, the transmission coefficient and extinction coefficient were also calculated for ZnTe thin films. Besides, the variation of extinction coefficient with wavelength has also been discussed here.


2019 ◽  
Vol 33 (11) ◽  
pp. 1950093 ◽  
Author(s):  
A. M. A. EL-Barry ◽  
D. M. Habashy

For reinforcement, the photochromic field and the cooperation between the theoretical and experimental branches of physics, the computational, theoretical artificial neural networks (CTANNs) and the resilient back propagation (R[Formula: see text]) training algorithm were used to model optical characterizations of casting (Admantan-Fulgide) thin films with different concentrations. The simulated values of ANN are in good agreement with the experimental data. The model was also used to predict values, which were not included in the training. The high precision of the model has been constructed. Moreover, the concentration dependence of both the energy gaps and Urbach’s tail were, also tested. The capability of the technique to simulate the experimental information with best accuracy and the foretelling of some concentrations which is not involved in the experimental data recommends it to dominate the modeling technique in casting (Admantan-Fulgide) thin films.


1989 ◽  
Vol 28 (14) ◽  
pp. 2918 ◽  
Author(s):  
Emile Pelletier ◽  
F. Flory ◽  
Y. Hu

2003 ◽  
Vol 94 (2) ◽  
pp. 879-888 ◽  
Author(s):  
P. D. Paulson ◽  
R. W. Birkmire ◽  
W. N. Shafarman

2010 ◽  
Vol 1245 ◽  
Author(s):  
Reza Anvari ◽  
Qi Cheng ◽  
Muhammad Lutful Hai ◽  
Truc Phan Bui ◽  
A. J. Syllaios ◽  
...  

AbstractThis paper presents the formation and the characterization of silicon germanium oxide (SixGeyO1-x-y) infrared sensitive material for uncooled microbolometers. RF magnetron sputtering was used to simultaneously deposit Si and Ge thin films in an Ar/O2 environment at room temperature. The effects of varying Si and O composition on the thin film's electrical properties which include temperature coefficient of resistance (TCR) and resistivity were investigated. The highest achieved TCR and the corresponding resistivity at room temperature were -5.41 %/K and 3.16×103 ohm cm using Si0.039Ge0.875O0.086 for films deposited at room temperature.


2021 ◽  
Vol 400 (1) ◽  
pp. 2100150
Author(s):  
Kalpana Sharma ◽  
Raveendra Melavanki ◽  
Basappa C Yallur ◽  
Raviraj Kusanur ◽  
N R Patil

2008 ◽  
pp. 302-302-9
Author(s):  
WD Partlow ◽  
WJ Choyke ◽  
JM Bennett ◽  
RM Silva

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