Low temperature metal-organic chemical vapor deposition of aluminum nitride with nitrogen trifluoride as the nitrogen source

Thin Solid Films ◽

10.1016/0040-6090(90)90469-t ◽

1990 ◽

Vol 189 (2) ◽

pp. L11-L14 ◽

Author(s):

J.H. Edgar ◽

Z.J. Yu ◽

A.U. Ahmed ◽

A. Rys

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Aluminum Nitride ◽

Nitrogen Source ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Nitrogen Trifluoride ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2006.08.030 ◽

2007 ◽

Vol 515 (5) ◽

pp. 2921-2925 ◽

Author(s):

Chunyu Wang ◽

Volker Cimalla ◽

Genady Cherkashinin ◽

Henry Romanus ◽

Majdeddin Ali ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Indium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Transparent Conducting ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Metal-organic chemical vapor deposition of quasi-normally-off AlGaN/GaN field-effect transistors on silicon substrates using low-temperature grown AlN cap layers

Applied Physics Letters ◽

10.1063/1.3475394 ◽

2010 ◽

Vol 97 (5) ◽

pp. 053502 ◽

Author(s):

S. Tan ◽

S. L. Selvaraj ◽

T. Egawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistors ◽

Chemical Vapor ◽

Organic Chemical ◽

Silicon Substrates ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Some Properties of Aluminum-Nitride Powder Prepared by Metal-Organic Chemical Vapor Deposition.

10.1002/chin.199545030 ◽

2010 ◽

Vol 26 (45) ◽

pp. no-no

Author(s):

K. KUBO ◽

K. ITATANI ◽

F. S. HOWELL ◽

A. KISHIOKA ◽

M. KINOSHITA

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Nitride Powder ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Low-Temperature and High-Quality Growth of Bi2O2Se Layered Semiconductors via Cracking Metal–Organic Chemical Vapor Deposition

ACS Nano ◽

10.1021/acsnano.1c00811 ◽

2021 ◽

Author(s):

Minsoo Kang ◽

Hyun-Jun Chai ◽

Han Beom Jeong ◽

Cheolmin Park ◽

In-young Jung ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

High Quality ◽

Layered Semiconductors ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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S/Mo ratio and petal size controlled MoS2 nanoflowers with low temperature metal organic chemical vapor deposition and their application in solar cells

Nanotechnology ◽

10.1088/1361-6528/abe32c ◽

2021 ◽

Vol 32 (19) ◽

pp. 195206

Author(s):

Jaeseo Park ◽

Hyeji Park ◽

Suho Park ◽

Nguyen Thi Thuy ◽

Jihun Mun ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Size Controlled

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Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590703 ◽

1999 ◽

Vol 17 (3) ◽

pp. 1101 ◽

Author(s):

Jean E. Kelsey ◽

Cindy Goldberg ◽

Guillermo Nuesca ◽

Gregory Peterson ◽

Alain E. Kaloyeros ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Copper Metallization ◽

Organic Chemical ◽

Tungsten Nitride ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Low temperature metal-organic chemical vapor deposition of advanced barrier layers for the microelectronics industry

Thin Solid Films ◽

10.1016/0040-6090(94)90479-0 ◽

1994 ◽

Vol 247 (1) ◽

pp. 85-93 ◽

Author(s):

Ivo J. Raaijmakers

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Barrier Layers ◽

Metal Organic ◽

Microelectronics Industry ◽

Organic Chemical Vapor Deposition

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Structural properties of titanium dioxide films grown on p-Si by metal-organic chemical vapor deposition at low temperature

Thin Solid Films ◽

10.1016/0040-6090(94)90640-8 ◽

1994 ◽

Vol 238 (1) ◽

pp. 12-14 ◽

Author(s):

Y.S. Yoon ◽

W.N. Kang ◽

S.S. Yom ◽

T.W. Kim ◽

M. Jung ◽

...

Keyword(s):

Titanium Dioxide ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Structural Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Titanium Dioxide Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Low-temperature atmospheric-pressure metal-organic chemical vapor deposition of molybdenum nitride thin films

Thin Solid Films ◽

10.1016/s0040-6090(96)08867-0 ◽

1996 ◽

Vol 288 (1-2) ◽

pp. 116-119 ◽

Author(s):

Renaud Fix ◽

Roy G. Gordon ◽

David M. Hoffman

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Organic Chemical ◽

Molybdenum Nitride ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Electrochemical Characteristics of Amorphous Titanium Carbide Films Produced by Low-Temperature Metal-Organic Chemical Vapor Deposition (MOCVD).

10.1002/chin.198815380 ◽

1988 ◽

Vol 19 (15) ◽

Author(s):

C. M. ALLOCA ◽

W. S. WILLIAMS ◽

A. E. KALOYEROS

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Titanium Carbide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Electrochemical Characteristics ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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