Characterization of low temperature GaAs grown by molecular beam epitaxy

1996 ◽  
Vol 92 ◽  
pp. 66-69 ◽  
Author(s):  
W.C. Lee ◽  
T.M. Hsu ◽  
J.-I. Chyi ◽  
G.S. Lee ◽  
W.-H. Li ◽  
...  
1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


1994 ◽  
Vol 64 (26) ◽  
pp. 3626-3628 ◽  
Author(s):  
T. M. Cheng ◽  
C. Y. Chang ◽  
T. C. Chang ◽  
J. H. Huang ◽  
M. F. Huang

1991 ◽  
Vol 241 ◽  
Author(s):  
Y. Hwang ◽  
D. Zhang ◽  
T. Zhang ◽  
M. Mytych ◽  
R. M. Kolbas

ABSTRACTIn this work we demonstrate that photopumped quantum wellheterostructure lasers with excellent optical quality can be grown ontop of a LT GaAs buffer layer by molecular beam epitaxy. Hightemperature thermal annealing of these lasers blue-shifts the laseremission wavelengths but the presence/absence of a LT GaAs layerhad little effect on the overall laser thresholds. Also, to first order itwas not necessary to include an AlAs barrier layer to preventadverse effects (as has been necessary in the gate stack of MESFETs to prevent carrier compensation).


1995 ◽  
Vol 77 (5) ◽  
pp. 2124-2127 ◽  
Author(s):  
T. M. Cheng ◽  
C. Y. Chang ◽  
T. M. Hsu ◽  
W. C. Lee ◽  
J. H. Huang

2013 ◽  
Vol 25 (6) ◽  
pp. 1523-1526
Author(s):  
万文坚 Wan Wenjian ◽  
尹嵘 Yin Rong ◽  
韩英军 Han Yingjun ◽  
王丰 Wang Feng ◽  
郭旭光 Guo Xuguang ◽  
...  

1996 ◽  
Vol 79 (11) ◽  
pp. 8488-8492 ◽  
Author(s):  
Jenn‐Fang Chen ◽  
Nie‐Chuan Chen ◽  
Shih‐Yang Chiu ◽  
Pie‐yong Wang ◽  
Wei‐I Lee ◽  
...  

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