Vacuum arc deposition of thin films from an LaB6 cathode

1996 ◽  
Vol 82 (3) ◽  
pp. 247-253 ◽  
Author(s):  
S. Schmidbauer ◽  
H. Klose ◽  
A. Ehrlich ◽  
M. Friedrich ◽  
M. Röder ◽  
...  
Keyword(s):  
Thin Films ◽  
Vacuum Arc ◽  
Vacuum Arc Deposition ◽  
Arc Deposition

Hemocompatibility of ZnO thin films prepared by filtered cathodic vacuum arc deposition

Vacuum ◽  
2013 ◽  
Vol 89 ◽  
pp. 220-224 ◽  
Author(s):  
Zhanyun Huang ◽  
Ping Luo ◽  
Wanzong Chen ◽  
Shirong Pan ◽  
Dihu Chen
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Vacuum Arc ◽  
Vacuum Arc Deposition ◽  
Filtered Cathodic Vacuum Arc ◽  
Arc Deposition

Arc behaviour during filtered vacuum arc deposition of Sn-O thin films

1995 ◽  
Vol 76-77 ◽  
pp. 181-189 ◽  
Author(s):  
L. Kaplan ◽  
V.N. Zhitomirsky ◽  
S. Goldsmith ◽  
R.L. Boxman ◽  
I. Rusman
Keyword(s):  
Thin Films ◽  
Vacuum Arc ◽  
Vacuum Arc Deposition ◽  
Arc Deposition

Fabrication for multilayered composite thin films by dual-channel vacuum arc deposition

2008 ◽  
Vol 79 (6) ◽  
pp. 065104 ◽  
Author(s):  
Hua Dai ◽  
Yao Shen ◽  
Jing Wang ◽  
Ming Xu ◽  
Liuhe Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Vacuum Arc ◽  
Composite Thin Films ◽  
Multilayered Composite ◽  
Dual Channel ◽  
Vacuum Arc Deposition ◽  
Arc Deposition

Macroparticle‐free thin films produced by an efficient vacuum arc deposition technique

1993 ◽  
Vol 74 (6) ◽  
pp. 4239-4241 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Ian Brown
Keyword(s):  
Thin Films ◽  
Vacuum Arc ◽  
Deposition Technique ◽  
Vacuum Arc Deposition ◽  
Arc Deposition

Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc deposition

Vacuum ◽  
2000 ◽  
Vol 59 (1) ◽  
pp. 159-167 ◽  
Author(s):  
R. Miyano ◽  
K. Kimura ◽  
K. Izumi ◽  
H. Takikawa ◽  
T. Sakakibara
Keyword(s):  
Thin Films ◽  
Vacuum Arc ◽  
Oxide Thin Films ◽  
Metal Nitride ◽  
Vacuum Arc Deposition ◽  
Arc Deposition

Influence of Bias Voltage on the Structural Properties and Adhesive Performance of ZnO Thin Films Deposited by Cathodic Vacuum Arc Deposition on Polyimide Foil Substrates

2010 ◽  
Vol 160-162 ◽  
pp. 194-199 ◽  
Author(s):  
Chang Ji Hu ◽  
Zhen Hui He
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Interfacial Shear Strength ◽  
Interfacial Shear ◽  
Zno Thin Films ◽  
Vacuum Arc ◽  
Zno Thin Film ◽  
Vacuum Arc Deposition ◽  
Polyimide Foil ◽  
Arc Deposition

ZnO thin films were deposited on polyimide foil substrates using cathodic vacuum arc deposition technique. X-ray diffraction was used to investigate the influence of bias voltage on the structure of ZnO thin films. The results show that all the samples have (002) preferred orientation. The internal stress of the films is compressive stress which increases with the bias voltage. Fragmentation test shows that the intrinsic interfacial shear strength of ZnO thin film without bias voltage is slightly lower than the shear yield strength of polyimide substrate; the intrinsic interfacial shear strength of ZnO thin film increases with the bias voltage from -50V to -200V, which indicates that bias voltage is beneficial to the enhancement of the adhesion between ZnO films and polyimide substrates. Further increase of the bias voltage to -300V leads to surface damage of the polyimide substrates.

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