Angular dependence of silicon oxide formation and gold segregation due to low-energy O2+ implantation

1992 ◽  
Vol 12 (1-2) ◽  
pp. 91-95 ◽  
Author(s):  
N. Menzel ◽  
K. Wittmaack
Keyword(s):  
Angular Dependence ◽  
Silicon Oxide ◽  
Low Energy ◽  
Oxide Formation

Mechanism of low temperature nitridation of silicon oxide layers by nitrogen plasma generated by low energy electron impact

1999 ◽  
Vol 85 (5) ◽  
pp. 2921-2928 ◽  
Author(s):  
Toshiko Mizokuro ◽  
Kenji Yoneda ◽  
Yoshihiro Todokoro ◽  
Hikaru Kobayashi
Keyword(s):  
Low Temperature ◽  
Electron Impact ◽  
Silicon Oxide ◽  
Nitrogen Plasma ◽  
Low Energy ◽  
Energy Electron ◽  
Oxide Layers ◽  
Low Energy Electron

Laser-induced molybdenum oxide formation by low energy (nJ)–high repetition rate (MHz) femtosecond pulses

2011 ◽  
Vol 33 (11) ◽  
pp. 1648-1653 ◽  
Author(s):  
M. Cano-Lara ◽  
S. Camacho-López ◽  
A. Esparza-García ◽  
M.A. Camacho-López
Keyword(s):  
Molybdenum Oxide ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
Low Energy ◽  
Femtosecond Pulses ◽  
Oxide Formation ◽  
High Repetition

scholarly journals Buried Oxide Formation in Low-Dose Low-Energy SIMOX

2003 ◽  
Vol 9 (S02) ◽  
pp. 504-505
Author(s):  
Tula Jutarosaga ◽  
Jun Sik Jeoung ◽  
Supapan Seraphin
Keyword(s):  
Low Dose ◽  
Low Energy ◽  
Oxide Formation ◽  
Buried Oxide

Interfacial silicon oxide formation during synthesis of ZrO2 on Si(100)

2000 ◽  
Vol 161 (1-2) ◽  
pp. 115-122 ◽  
Author(s):  
Y.-M Sun ◽  
J Lozano ◽  
H Ho ◽  
H.J Park ◽  
S Veldman ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Formation

Oxide formation on chromium metal surfaces by low-energy oxygen implantation at room temperature

2017 ◽  
Vol 636 ◽  
pp. 225-231 ◽  
Author(s):  
Robert Peter ◽  
Iva Saric ◽  
Ivna Kavre Piltaver ◽  
Ivana Jelovica Badovinac ◽  
Mladen Petravic
Keyword(s):  
Metal Surfaces ◽  
Room Temperature ◽  
Low Energy ◽  
Oxide Formation ◽  
Oxygen Implantation
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