MEASUREMENTS OF STRUCTURAL RELAXATION IN AMORPHOUS Pd82 Si18: X-RAY DIFFRACTION AND ELECTRICAL RESISTIVITY

Bi1.7-Pb0.3-Sr2-Ca2-Cu3-Ox superconducting samples were prepared at 855°C, 862 C, 870 C, and 882 C sintering temperatures respectively. All samples were sintered for 120 hours. The samples were then quenched in liquid nitrogen. The electrical resistivity measurements showed that the samples sintered at 870° C had the best Tc. For these samples the Tc onset was around 120 K and the zero resistance was obtained at 108 K. X-ray diffraction studies showed that the samples were multiphased.

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Evolution of crystal structure of dual layered molecular conductor (ET)4ZnBr4(C6H4Cl2) with temperature

CrystEngComm ◽

10.1039/d1ce00902h ◽

2021 ◽

Author(s):

Gennady V. Shilov ◽

Elena I. Zhilyaeva ◽

Sergey M. Aldoshin ◽

Alexandra M Flakina ◽

Rustem B. Lyubovskii ◽

...

Keyword(s):

Crystal Structure ◽

Electrical Resistivity ◽

Single Crystal ◽

Room Temperature ◽

Organic Conductor ◽

X Ray Diffraction ◽

X Ray ◽

Resistivity Measurements ◽

Molecular Conductor ◽

Abrupt Changes

Electrical resistivity measurements of a dual layered organic conductor (ET)4ZnBr4(1,2-C6H4Cl2) above room temperature show abrupt changes in resistivity at 320 K. Single-crystal X-ray diffraction studies in the 100-350 K range...

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Synthesis, Structure and Magnetism of ErCoIn5

MRS Proceedings ◽

10.1557/proc-848-ff3.7 ◽

2004 ◽

Vol 848 ◽

Author(s):

Evan Lyle Thomas ◽

Erin E. Erickson ◽

Monica Moldovan ◽

David P. Young ◽

Julia Y. Chan

Keyword(s):

Magnetic Properties ◽

Electrical Resistivity ◽

Magnetic Susceptibility ◽

Single Crystal ◽

Experimental Results ◽

Flux Growth ◽

X Ray Diffraction ◽

Metallic Behavior ◽

X Ray ◽

Growth Method

AbstractA new member of the LnMIn5 family, ErCoIn5, has been synthesized by a flux-growth method. The structure of ErCoIn5 was determined by single crystal X-ray diffraction. It crystallizes in the tetragonal space group P4/mmm, Z = 1, with lattice parameters a = 4.5400(4) and c = 7.3970(7) Å, and V = 152.46(2) Å3. Electrical resistivity data show metallic behavior. Magnetic susceptibility measurements show this compound to be antiferromagnetic with TN = 5.1 K. We compare these experimental results with those of LaCoIn5 in an effort to better understand the effect of the structural trends observed on the transport and magnetic properties.

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The effect of structural changes during sintering on the electric and magnetic traits of the Ni96.7Mo3.3 alloy nanostructured powder

Science of Sintering ◽

10.2298/sos0902175r ◽

2009 ◽

Vol 41 (2) ◽

pp. 175-184 ◽

Cited By ~ 7

Author(s):

L. Ribic-Zelenovic ◽

M. Spasojevic ◽

A. Maricic ◽

M.M. Ristic

Keyword(s):

Electrical Resistivity ◽

Magnetic Permeability ◽

Structural Relaxation ◽

Crystalline Phase ◽

Structural Changes ◽

X Ray Diffraction ◽

Scanning Calorimetry ◽

Fcc Lattice ◽

Lower Permeability ◽

Structural Powder

Ni96.7Mo3.3 powder was electrochemically obtained. An X-ray diffraction analysis determined that the powder consisted of a 20% amorphous and 80% crystalline phase. The crystalline phase consisted of a nanocrystalline solid nickel and molybdenum solution with a face-centred cubic (FCC) lattice with a high density of chaotically distributed dislocations and high microstrain value. The scanning electronic microscopy (SEM) showed that two particle structures were formed: larger cauliflower-like particles and smaller dendriteshaped ones. The thermal stability of the alloy was examined by differential scanning calorimetry (DSC) and by measuring the temperature dependence of the electrical resistivity and magnetic permeability. Structural powder relaxation was carried out in the temperature range of 450 K to 560 K causing considerable changes in the electrical resistivity and magnetic permeability. Upon structural relaxation, the magnetic permeability of the cooled alloy was about 80% higher than the magnetic permeability of the fresh powder. The crystallisation of the amorphous portion of the powder and crystalline grain increase occurred in the 630 K to 900 K temperature interval. Upon crystallisation of the amorphous phase and crystalline grain increase, the powder had about 50% lower magnetic permeability than the fresh powder and 3.6 times lower permeability than the powder where only structural relaxation took place.

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The Structure and Electrical Property of sp2 Rich Carbon Films by Magnetron Sputtering

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.998-999.120 ◽

2014 ◽

Vol 998-999 ◽

pp. 120-123

Author(s):

Jun Du ◽

Xiao Ying Zhu ◽

Yan Zang ◽

Lei Guo

Keyword(s):

Electrical Resistivity ◽

Magnetron Sputtering ◽

Carbon Films ◽

Wear Volume ◽

Chemical Bonds ◽

Micro Hardness ◽

X Ray Diffraction ◽

Sputtering Deposition ◽

X Ray ◽

Pin On Disk

sp2 rich carbon films were produced by using magnetron sputtering deposition. The hardness, friction coefficient and wear volume were elevated by Knoop micro-hardness and pin-on-disk tester; The composition and microstructure of the carbon films have been characterized in detail by combining the techniques of Rutherford Backscattering Spectrum (RBS), X-Ray Photoelectron Spectrum (XPS) and X-Ray Diffraction (XRD); the electrical resistivity was measured by Four Probe Methods (FPM). It is found that: the films hardness are 11~17GPa (HK0.05), the friction coefficients are 0.1-0.2, the wear rate is 10-15m3/Nm; The maximum intensity position in the C1s indicates the chemical bonds are mainly sp2; the electrical resistivity is 1~2×10-4Ω·m. XRD proves these carbon films are amorphous.

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Interdiffusion in Co/Ta Multilayer Thin Films

Defect and Diffusion Forum ◽

10.4028/www.scientific.net/ddf.237-240.554 ◽

2005 ◽

Vol 237-240 ◽

pp. 554-559 ◽

Cited By ~ 1

Author(s):

Hui Myeong Lee ◽

Byeong Seon Lee ◽

Chan Gyu Lee ◽

Yasunori Hayashi ◽

Bon Heun Koo

Keyword(s):

Structural Relaxation ◽

Multilayer Thin Films ◽

X Ray Diffraction ◽

Stress Release ◽

X Ray ◽

Angle Measurements ◽

Peak Intensity ◽

Straight Line ◽

Initial Stage ◽

Interdiffusion Coefficients

We will discuss the stress release phenomena, structural relaxation and interdiffusion processes during annealing. The [Co(4nm)/Ta(4nm)]38 multilayers were prepared by dc magnetron sputtering on Si substrate. The multilayers were annealed at various temperatures (523 - 673K) in vacuum (under 10-5 torr) furnace. The effective interdiffusion coefficients were determined from the slope of the best straight line fit of the first peak intensity versus annealing time [d ln(I(t)/I(0)) /dt] by X-ray diffraction (XRD) low angle measurements. The drastic decrease of the relative intensity in the initial stage shown due to the structural relaxation was excluded in the calculation of effective interdiffusion coefficients. The temperature dependence of interdiffusion in the range of 523 - 673K is described by D = 3.2×10-19 exp(-0.51±0.11 eV/kT) m2s-1.

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