Physical Sputtering and Sputter Deposition (Sputtering)

1998 ◽  
pp. 343-405
Author(s):  
Donald M. Mattox
Keyword(s):  
Sputter Deposition ◽  
Physical Sputtering

Physical Sputtering and Sputter Deposition

2018 ◽  
pp. 87-149
Author(s):  
Donald M. Mattox
Keyword(s):  
Sputter Deposition ◽  
Physical Sputtering

STM studies of crystal growth

1991 ◽  
Vol 49 ◽  
pp. 374-375
Author(s):  
M. G. Lagally
Keyword(s):  
Crystal Growth ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Sputter Deposition ◽  
Field Of View ◽  
Scanning Tunneling ◽  
Wide Field ◽  
Tunneling Microscopy ◽  
Wide Field Of View ◽  
The One

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.

Observation by HVEM of the martensite transformation and the superconducting transition in Nb3Sn

1988 ◽  
Vol 46 ◽  
pp. 788-789
Author(s):  
M. A. Kirk ◽  
M. C. Baker ◽  
B. J. Kestel ◽  
H. W. Weber
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Superconducting State ◽  
Martensite Transformation ◽  
Sputter Deposition ◽  
Diffusion Reaction ◽  
Solute Diffusion ◽  
Superconducting Transition ◽  
Twin Boundaries ◽  
Martensite Structure

It is well known that a number of compound superconductors with the A15 structure undergo a martensite transformation when cooled to the superconducting state. Nb3Sn is one of those compounds that transforms, at least partially, from a cubic to tetragonal structure near 43 K. To our knowledge this transformation in Nb3Sn has not been studied by TEM. In fact, the only low temperature TEM study of an A15 material, V3Si, was performed by Goringe and Valdre over 20 years ago. They found the martensite structure in some foil areas at temperatures between 11 and 29 K, accompanied by faults that consisted of coherent twin boundaries on {110} planes. In pursuing our studies of irradiation defects in superconductors, we are the first to observe by TEM a similar martensite structure in Nb3Sn.Samples of Nb3Sn suitable for TEM studies have been produced by both a liquid solute diffusion reaction and by sputter deposition of thin films.

Sputter Deposition of YSZ Epitaxial Buffer Layer at Wafer Level for Piezoelectric MEMS Utilizing PZT-based Monocrystalline Thin Film

2016 ◽  
Vol 136 (10) ◽  
pp. 437-442 ◽  
Author(s):  
Shinsuke Nishizawa ◽  
Shinya Yoshida ◽  
Kiyotaka Wasa ◽  
Shuji Tanaka
Keyword(s):  
Thin Film ◽  
Buffer Layer ◽  
Sputter Deposition ◽  
Wafer Level ◽  
Piezoelectric Mems

Sputter Deposition Method for III-V Semiconductor

2001 ◽  
Author(s):  
Curt M. Lampkin
Keyword(s):  
Sputter Deposition ◽  
Deposition Method

scholarly journals Effects of Alloying Elements on the Corrosion Behavior of Sputter–deposited Zr–(12–21)Cr–W Alloys in 0.5 M NaCl Solution

1970 ◽  
Vol 25 ◽  
pp. 75-82
Author(s):  
Basu Ram Aryal ◽  
Jagadeesh Bhattarai
Keyword(s):  
Corrosion Test ◽  
Open Circuit Potential ◽  
Chemical Society ◽  
Open Circuit ◽  
Sputter Deposition ◽  
Nacl Solution ◽  
Corrosion Rates ◽  
Sputter Deposited ◽  
Stable Passivity ◽  
Zirconium Metal

The synergistic effect of the simultaneous additions of tungsten and zirconium in thesputter-deposited amorphous or nanocrystalline Zr-(12-21)Cr-W alloys is studied in 0.5 MNaCl solution open to air at 25°C using corrosion tests and open circuit potentialmeasurements. Corrosion rates of the sputter-deposited Zr-(12-21)Cr-W alloys containing10-80 at % tungsten (that is, 0.95-1.85 x 10-2 mm.y-1) are more than one order of magnitudelower than that of the sputter-deposited tungsten and even lower than those of zirconium aswell as chromium in 0.5 M NaCl solution. The addition of 8-73 at % zirconium content inthe sputter-deposited binary W-(12-21)Cr alloys seems to be more effective to improve thecorrosion-resistant properties of the sputter-deposited ternary Zr-Cr-W alloys containing12-21 at % chromium in 0.5 M NaCl solution. The sputter-deposited Zr-(17-21)Cr-W alloyscontaining an adequate amounts of zirconium metal showed the more stable passivity andshowed higher corrosion resistance than those of alloy-constituting elements in 0.5 M NaClsolution open to air at 25°C.Keywords: Zr-(12-21)Cr-W alloys, sputter deposition, corrosion test, open circuit potential,0.5 M NaCl.DOI:  10.3126/jncs.v25i0.3305Journal of Nepal Chemical Society Volume 25, 2010 pp 75-82

Sputter deposition and annealing of Ta, TaSix and TaBx composite films and their application in next generation lithography masks

2000 ◽  
Vol 18 (4) ◽  
pp. 1119-1124 ◽  
Author(s):  
Kenneth Racette ◽  
Cameron Brooks ◽  
C. Richard Guarnieri ◽  
Dennis Hendy
Keyword(s):  
Composite Films ◽  
Sputter Deposition ◽  
Next Generation ◽  
Next Generation Lithography
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