Tight-binding quantum chemical molecular dynamics simulation of mechano-chemical reactions during chemical–mechanical polishing process of SiO2 surface by CeO2 particle

2005 ◽  
Vol 244 (1-4) ◽  
pp. 34-38 ◽  
Author(s):  
Arivazhagan Rajendran ◽  
Yasufumi Takahashi ◽  
Michihisa Koyama ◽  
Momoji Kubo ◽  
Akira Miyamoto
Keyword(s):  
Molecular Dynamics ◽  
Chemical Mechanical Polishing ◽  
Quantum Chemical ◽  
Tight Binding ◽  
Dynamics Simulation ◽  
Polishing Process ◽  
Sio2 Surface ◽  
Chemical Mechanical Polishing Process ◽  
Ceo2 Particle ◽  
Quantum Chemical Molecular Dynamics

Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface

2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 1897-1902 ◽  
Author(s):  
Toshiyuki Yokosuka ◽  
Katsumi Sasata ◽  
Hitoshi Kurokawa ◽  
Seiichi Takami ◽  
Momoji Kubo ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Chemical Mechanical Polishing ◽  
Quantum Chemical ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Chemical Mechanical Polishing Process ◽  
Quantum Chemical Molecular Dynamics
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