Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface

2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 1897-1902 ◽  
Author(s):  
Toshiyuki Yokosuka ◽  
Katsumi Sasata ◽  
Hitoshi Kurokawa ◽  
Seiichi Takami ◽  
Momoji Kubo ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Chemical Mechanical Polishing ◽  
Quantum Chemical ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Chemical Mechanical Polishing Process ◽  
Quantum Chemical Molecular Dynamics

Cooperative Roles of Chemical Reactions and Mechanical Friction in Chemical Mechanical Polishing of Gallium Nitride Assisted by OH Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations

2021 ◽  
Author(s):  
Kentaro Kawaguchi ◽  
Yang Wang ◽  
Jingxiang Xu ◽  
Yusuke Ootani ◽  
Yuji Higuchi ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Gallium Nitride ◽  
Chemical Mechanical Polishing ◽  
Quantum Chemical ◽  
Laser Diodes ◽  
Tight Binding ◽  
Mechanical Polishing ◽  
Oh Radicals ◽  
Dynamics Simulations ◽  
Quantum Chemical Molecular Dynamics

Chemical mechanical polishing (CMP) is a key manufacturing process for applying gallium nitride (GaN), especially the Ga-face GaN, to semiconductor devices such as laser diodes. However, the CMP efficiency for...

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