A correlation study of layer growth rate, thickness uniformity, stoichiometry, and hydrogen impurity level in HfO2 thin films grown by ALD between 100°C and 350°C
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1984 ◽
Vol 23
(2)
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pp. 247-266
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2013 ◽
Vol 740-742
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pp. 107-110
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2013 ◽
Vol 756-759
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pp. 117-120
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1977 ◽
Vol 41
(7)
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pp. 670-678
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2010 ◽
Vol 248
(3)
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pp. 594-599
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