New Opportunities in Lead Selenide Nanolayers

The article deals with the peculiarities of creation of effective negative pressure and the increase in the forbidden gap width in PbSe nanolayers. The dielectric state that maybe realized under these conditions and their appropriate doping can be considered as a new resource in lead selenide nanolayers. The increasing of the tangential lattice constant with higher growth temperature and layer growth rate confirms this consideration. When determining the forbidden gap width, the optical transmission spectra were processed by a model of the Fabry-Perot interferometer, and, at high concentration of free current carriers, the absorption on them and their degeneracy were taken into consideration.

Effect of K2Cr2O7 Concentration on Army Green Ceramic Layer Formed of 2A12 Alloy by Micro-Arc Oxidation

2A12 alloy by MAO on main salts electrolyte system of phosphate sodium is investigated. By contrast test, the influences of arc starting voltage, the thickness of the ceramic layer , growth rate, and wear resistance with different K2Cr2O7concentration are analyzed. If K2Cr2O7concentration is 2.5g/L , the arc starting voltage reached the lowest, the surface topography is the best, the wear resistance is the well.

Effect of a Gas Pressure on the Growth Rate of AlN Layer

The dependence of the layer growth rate on a gas (argon, nitrogen) pressure inside the reactor has been examined in order to analyze the conditions of growth of AlN thick layers and bulk crystals by the sublimation sandwich-method. It is shown that the layer growth rate steadily increases as the pressure in the reactor decreases in a wide pressure interval 1–0.02 bar. This suggests that a key role in the layer growth kinetics is played by the source-to-substrate transfer of the components (Al, N), rather than the adsorption - desorption processes on the source and substrate surface. In addition the growth rate in argon atmosphere is much higher than in nitrogen one for the high pressures and is practically the same for the lowest (0.05 – 0.02 bar).

Stability of a-C:N:H Layers Deposited by RF Plasma Enhanced CVD

A series of amorphous hydrogenated carbon layers doped with nitrogen (a-C:N:H) was deposited on Si (001). The synthesis was performed from gaseous N2/CH4 mixture using PE CVD (RF CVD technique; 13,56 MHz). An influence of the processing conditions on layer-growth rate was analysed. Thickness of the layers deposited during 1 hour at various temperatures, pressures and RF powers were taken as a basis. It has been proved that the substrate temperature is a key parameter for the layer formation. Temperature rise results in the deposition rate decrease. This unfavourable effect may be reduced by application of increased gas pressure and/or higher plasma RF generator power. At optimal conditions (46 oC; 0,8 Tr; 60 W) the deposition rate reaches up to 600 nm/hour. FT-IR spectra of the layers were measured within 1250 - 4000 cm-1 and discussed with regard to the atomic structure. The intensities of the characteristic absorption bands were compared. The results show that the layers have various N/C ratios according to the applied processing conditions.