Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2- and 3-step atomic layer deposition process
Keyword(s):
2019 ◽
Vol 37
(1)
◽
pp. 010901
◽
1997 ◽
Vol 181
(3)
◽
pp. 259-264
◽
2002 ◽
Vol 408
(1-2)
◽
pp. 97-103
◽