Atomic layer deposition process with TiF_4 as a precursor for depositing metal fluoride thin films
2019 ◽
Vol 37
(1)
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pp. 010901
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Keyword(s):
1997 ◽
Vol 181
(3)
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pp. 259-264
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2002 ◽
Vol 408
(1-2)
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pp. 97-103
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