scholarly journals MoS2 thin films from a (NtBu)2(NMe2)2Mo and 1-propanethiol atomic layer deposition process

2019 ◽  
Vol 37 (1) ◽  
pp. 010901 ◽  
Author(s):  
Berc Kalanyan ◽  
Ryan Beams ◽  
Michael B. Katz ◽  
Albert V. Davydov ◽  
James E. Maslar ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2- and 3-step atomic layer deposition process

2021 ◽  
pp. 152062
Author(s):  
Jin-Hyeok Lee ◽  
Romel Hidayat ◽  
Rahul Ramesh ◽  
Hyeonsu Roh ◽  
Dip K. Nandi ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Tert Butyl ◽  
Layer Deposition

Characteristics of Tantalum Carbo-nitride Thin Films Deposited with Atomic Layer Deposition Process

2019 ◽  
Vol 16 (4) ◽  
pp. 227-236 ◽  
Author(s):  
Moonkyun Song ◽  
Shiwoo Rhee
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Atomic layer deposition process with TiF_4 as a precursor for depositing metal fluoride thin films

2008 ◽  
Vol 47 (13) ◽  
pp. C271 ◽  
Author(s):  
Tero Pilvi ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
Martin Bischoff ◽  
Ute Kaiser ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Metal Fluoride ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

2013 ◽  
Vol 102 (13) ◽  
pp. 131603 ◽  
Author(s):  
G. Seguini ◽  
E. Cianci ◽  
C. Wiemer ◽  
D. Saynova ◽  
J. A. M. van Roosmalen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Deposition Process ◽  
Thermal Budget ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition ◽  
Low Thermal Budget

A Novel Atomic Layer Deposition Process for Depositing Metal Fluoride Thin Films

2007 ◽  
Author(s):  
Tero Pilvi ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
Martin Bischoff ◽  
Norbert Kaiser
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Metal Fluoride ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Effect of growth conditions on formation of TiO2-II thin films in atomic layer deposition process

1997 ◽  
Vol 181 (3) ◽  
pp. 259-264 ◽  
Author(s):  
Jaan Aarik ◽  
Aleks Aidla ◽  
Väino Sammelselg ◽  
Teet Uustare
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Growth Conditions ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process

2002 ◽  
Vol 408 (1-2) ◽  
pp. 97-103 ◽  
Author(s):  
Jaan Aarik ◽  
Aleks Aidla ◽  
Hugo Mändar ◽  
Teet Uustare ◽  
Väino Sammelselg
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Structure Formation ◽  
Growth Kinetics ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition
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