Effect of ammonia (NH3) plasma treatment on silicon nitride (SiNx) gate dielectric for organic thin film transistor with soluble organic semiconductor
2011 ◽
Vol 11
(5)
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pp. S67-S72
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2015 ◽
Vol 62
(7)
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pp. 2313-2319
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2014 ◽
Vol 14
(8)
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pp. 6172-6176
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2013 ◽
Vol 13
(5)
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pp. 3313-3316
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2008 ◽
Vol 8
(9)
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pp. 4561-4564
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