Purpose
Development of (1T-type) ferroelectric random access memory (FeRAM) has most actively progressed since 1995 and motivated by the physical limits and technological drawbacks of the flash memory. 1T-type FeRAM implements ferroelectric layer at the field effect transistor (FET) gate. During the course of the investigation, it was very difficult to form a thermodynamically stable ferroelectric-semiconductor interface at the FET gate, leading to the introduction of one insulating buffer layer between the ferroelectric and the silicon substrate to overcome this problem. In this study, Al2O3 a high-k buffer layer deposited by plasma enhanced atomic layer deposition (PEALD) is sandwiched between the ferroelectric layer and silicon substrate.
Design/methodology/approach
Ferroelectric/high-k gate stack were fabricated on the silicon substrate and pt electrode. Structural characteristics of the ferroelectric (PZT) and high-k (Al2O3) thin film deposited by RF sputtering and PEALD, respectively, were optimized and investigated for different process parameters. Metal/PZT/Metal, Metal/PZT/Silicon, Metal/PZT/Al2O3/Silicon structures were fabricated and electrically characterized to obtain the memory window, leakage current, hysteresis, PUND, endurance and breakdown characteristics.
Findings
XRD pattern shows the ferroelectric perovskite thin Pb[Zr0.35Ti0.65]O3 film with (101) tetragonal orientation deposited by sputtering and PEALD Al2O3 with (312) orientation showing amorphous nature. Multiple angle analysis shows that the refractive index of PZT varies from 2.248 to 2.569, and PEALD Al2O3 varies from 1.6560 to 1.6957 with post-deposition annealing temperature. Increase in memory window from 2.3 to 8.4 V for the Metal-Ferroelectric-Silicon (MFS) and Metal-Ferroelectric-Insulator-Semiconductor (MFIS) structure has been observed at the annealing temperature of 500°C. MFIS structure with 10 nm buffer layer shows excellent endurance of 3 × 109 read-write cycles and the breakdown voltage of 33 V.
Originality/value
This paper shows the feature, principle and improvement in the electrical properties of the fabricated gate stack for 1T-type nonvolatile FeFET. The insulating buffer layer sandwiched between ferroelectric and silicon substrate acts as a barrier to ferroelectric–silicon interdiffusion improves the leakage current, memory window, endurance and breakdown voltage. This is perhaps the first time that the combination of sputtered PZT on the PEALD Al2O3 layer is being reported.