Vanadium oxide thin films on quartz and Al6061 with reduced phase transition temperature and low solar absorptance for advanced thermal control application in space

2019 ◽  
Vol 45 (18) ◽  
pp. 25097-25107
Author(s):  
Dipta Mukherjee ◽  
Arjun Dey ◽  
Anoop Kumar Mukhopadhyay
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Transition Temperature ◽  
Vanadium Oxide ◽  
Phase Transition Temperature ◽  
Thermal Control ◽  
Oxide Thin Films ◽  
Solar Absorptance ◽  
Vanadium Oxide Thin Films ◽  
Control Application

Fabrication of Vanadium Oxide Film with Low Phase Transition Temperature by Magnetron Sputtering and Reduction Post-Anneal Method

2014 ◽  
Vol 496-500 ◽  
pp. 227-230
Author(s):  
Ya Qiao ◽  
Yuan Lu ◽  
Hua Yang ◽  
Yong Shun Ling
Keyword(s):  
Phase Transition ◽  
Transition Temperature ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Phase Transition Temperature ◽  
Characteristic Curve ◽  
Glass Substrates ◽  
Vanadium Metal ◽  
Vanadium Dioxide Film ◽  
Vanadium Oxide Thin Films

Vanadium oxide thin films were deposited on ordinary glass substrates by direct current (DC) magnetron sputtering from a vanadium metal target and subsequent reduction annealing. The deposition and annealing parameters were given in detail. The samples were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM). The phase transition of the film was observed by measuring its resistance-temperature (R-T) characteristic curve. The results indicated that the film fabricated had a semiconductor-metal phase transition temperature of about 52°C, which is 16°C lower than the common phase transition temperature of vanadium dioxide film.

Phase transition properties of vanadium oxide thin films irradiated by nanosecond laser

2015 ◽  
Vol 27 (5) ◽  
pp. 59001
Author(s):  
李宏哲 Li Hongzhe ◽  
盛传祥 Sheng Chuanxiang ◽  
厉申博 Li Shenbo ◽  
顾国华 Gu Guohua ◽  
任侃 Ren Kan ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Vanadium Oxide ◽  
Nanosecond Laser ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

scholarly journals Preparation and characteristic of phase transition vanadium oxide thin films by rapid thermal process

2012 ◽  
Vol 61 (18) ◽  
pp. 188101
Author(s):  
Wu Bin ◽  
Hu Ming ◽  
Hou Shun-Bao ◽  
L Zhi-Jun ◽  
Gao Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Vanadium Oxide ◽  
Thermal Process ◽  
Rapid Thermal Process ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

Physical properties and phase transition observed in vanadium oxide thin films deposited by RF magnetron sputtering

2019 ◽  
Vol 6 (5) ◽  
pp. 056415
Author(s):  
Dwight Acosta ◽  
G Chavez-Esquivel ◽  
Carlos Magaña ◽  
Francisco Hernández ◽  
A Pérez-Pacheco ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Magnetron Sputtering ◽  
Physical Properties ◽  
Vanadium Oxide ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

Vanadium Oxide Thin Films Synthesized by Reactive Ion Beam Sputter Deposition: Influence of Processing Parameters

2012 ◽  
Vol 730-732 ◽  
pp. 251-256
Author(s):  
Carlos Batista ◽  
Ricardo M. Ribeiro ◽  
Vasco Teixeira
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Vanadium Oxide ◽  
Near Infrared ◽  
Ion Beam ◽  
Infrared Range ◽  
Ion Beam Sputtering ◽  
Oxide Thin Films ◽  
Seeding Layer ◽  
Vanadium Oxide Thin Films

Vanadium oxide thin films were deposited by reactive ion beam sputtering deposition onto glass substrates. The films were prepared by sputtering from a metallic vanadium target with an argon+oxygen ion beam in vacuum. Different processing conditions were evaluated with focus in obtaining monoclinic VO2(M) phase, which is known to exhibit a semiconducting-metal phase transition near room temperature. X-ray diffractometry (XRD) analyses revealed amorphous films for temperatures below 500°C. In crystalline films, the co-existence of VO2(M) with other phases was suppressed by pre-depositing a very thin metallic vanadium seeding layer which showed to promote the formation of single phase VO2(M) films. The VO2(M) films showed clearly the distinctive optical modulation behavior at the near-infrared range when going through the phase transition. The temperature dependence of sheet resistance supports the optical analyses revealing an evident semiconducting-metal behavior change up to over 2 orders of magnitude.

Structure Characterization of W-Doped Vanadium Oxide Thin Films Prepared by Reactive Magnetron Sputtering

2013 ◽  
Vol 690-693 ◽  
pp. 1694-1697
Author(s):  
Shuang Chen ◽  
Li Fang Zhang ◽  
Shu Juan Xiao ◽  
Cui Zhi Dong
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Structure Characterization ◽  
Root Mean Square Roughness ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

W-doped Vanadium oxide thin films were prepared on the substrates of SiO2 glass, float glass and Si (100) by reactive magnetron sputtering after annealing in vacuum. The structure, morphology and phase transition were characterized by X-ray diffractometer, atomic force microscopy (AFM) and differential thermal analysis (DTA), respectively. The results show that, the major phase of W-doped films on SiO2 glass is VO2.Dopant reduce the phase transition temperature of VO2 thin films to 21.9°C. The root-mean-square roughness of the film increase for the longer deposition time.

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