Poisoning effect of K with respect to Cu/ZSM-5 used for NO reduction

2021 ◽  
Vol 44 ◽  
pp. 100465
Author(s):  
Hongyan Xue ◽  
Xiaoming Guo ◽  
Tao Meng ◽  
Dongsen Mao ◽  
Zhen Ma
2018 ◽  
Vol 8 (1) ◽  
pp. 95 ◽  
Author(s):  
Chengzhi Wang ◽  
Cheng Zhang ◽  
Yonggang Zhao ◽  
Xin Yan ◽  
Peng Cao

2016 ◽  
Vol 44 (2) ◽  
pp. 232-238 ◽  
Author(s):  
Dong-jie YAN ◽  
Ya YU ◽  
Xue-min HUANG ◽  
Shu-jun LIU ◽  
Ying-hui LIU

2001 ◽  
Vol 203 (2) ◽  
pp. 369-374 ◽  
Author(s):  
Piotr Decyk ◽  
Do Kyoung Kim ◽  
Seong Ihl Woo

1985 ◽  
Vol 20 (2) ◽  
pp. 55-67
Author(s):  
W.B. Anderson ◽  
P.M. Huck ◽  
T.M.R. Meadley ◽  
T.P. Hynes

Abstract This paper describes the on-going pilot scale development of a new treatment process designed to remove radium-226 from uranium milling effluents. Presently, decants from Canadian uranium mining and milling tailings areas are treated with barium chloride to remove radium-226 prior to discharge into the environment. This is usually accomplished in large natural or man-made ponds which provide an opportunity for a (Ba,Ra)SO4 precipitate to form and subsequently settle. Sand filtration is sometimes used as a polishing step. This new process differs from conventional and other experimental processes in that it involves the use of a fluidized bed to facilitate the deposition of a (Ba,Ra)SO4 precipitate on a granular medium of high surface area. As a stand-alone treatment process, the new process is consistently able to reduce incoming radium-226 activity levels by 90-99%. Effluent levels of 10 pCi/L (0.370 Bq/L) or less have been achieved, depending on the influent activity levels. Recent testing of the process as a polishing step has demonstrated radium removal efficiencies up to 60% when the process influent was already less than 5 pCi/L (0.185 Bq/L). The process has been operated at temperatures ranging from 26°C down to 0.3°C with no reduction in efficiency. In contrast to treatment times in the order of days for conventional settling pond systems and hours for mechanical stirred tank/filtration systems, the new process is able to achieve these radium removal efficiencies in times on the order of one minute.


1995 ◽  
Vol 31 (12) ◽  
pp. 239-248 ◽  
Author(s):  
Ana Emparanza-Knörr ◽  
Francisco Torrella

The Salmonella presence and the microbiological quality indicators, total and fecal coliforms and coliphages of E. coli C, have been studied in a overloaded wastewater lagoon system treating urban wastewatrers of the village of Guardamar del Segura (Alicante, Spain). Classical microbiological technology to detect salmonellae was used, including pre-enrichment, enrichment, selective media plating and biochemical and serological confirmation. Water was physicochemically characterized according to COD, SS, temperature, pH and dissolved oxygen. The selective migration step through Rappaport-Vassiliadis semisolid agar medium was essential for the consistent detection of Salmonella in the different lagoon effluents. Total and fecal coliform levels of up to 105-106 MPN/100 ml were detected in the final effluent. High coliphage concentrations of 103-104 pfu/ml were also found in the effluent waters. Salmonella was always detected in 100 ml samples and eventually reached an order of value of 103 MPN/100 ml. Total coliform reduction was higher in the anaerobic ponds whereas fecal coliforms were more efficiently eliminated in the facultative (mostly “anoxic”) lagoons. Coliphage reduction was higher in the facultative lagoons when compared to the anaerobic ponds. On many occasions, no reduction or eventual increment of the concentration of salmonellae was detected in the effluents from the anaerobic ponds compared to concentrations of the patohogen in the influent raw wasterwaters. The possibility exists for a capacity of Salmonella to multiply in the anoxic phase of the wastewater treatment, but the presence of microorganisms in raw sewage waters which could maskSalmonella detection with the enrichment methodology employed cannot be ruled out.


2019 ◽  
Vol 232 ◽  
pp. 88-98 ◽  
Author(s):  
Jian Liu ◽  
Rui-tang Guo ◽  
Xiao Sun ◽  
Wei-guo Pan ◽  
Zhong-yi Wang ◽  
...  
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