Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 1. Growth mechanism, structure, and surface morphology of silicon carbonitride films

Surface Morphology ◽

Growth Mechanism ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 1. Growth mechanism and chemical structure of deposited a-SiC:H films

Thin Solid Films ◽

10.1016/j.tsf.2014.04.087 ◽

2014 ◽

Vol 564 ◽

pp. 222-231 ◽

Cited By ~ 6

Author(s):

A.M. Wrobel ◽

A. Walkiewicz-Pietrzykowska ◽

P. Uznanski

Keyword(s):

Growth Mechanism ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 2. Properties of deposited silicon carbonitride films

Thin Solid Films ◽

10.1016/j.tsf.2005.09.191 ◽

2006 ◽

Vol 497 (1-2) ◽

pp. 35-41 ◽

Cited By ~ 15

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

D.M. Bielinski

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Field emission of polycrystalline diamond films grown by microwave-plasma chemical vapor deposition. I. Effects of surface morphology of diamond

Diamond and Related Materials ◽

10.1016/s0925-9635(02)00186-3 ◽

2002 ◽

Vol 11 (12) ◽

pp. 1897-1904 ◽

Cited By ~ 5

Author(s):

Takayuki Toyama ◽

Yasuo Koide ◽

Masanori Murakami

Keyword(s):

Surface Morphology ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 2. Surface morphology and properties of deposited a-SiC:H films

Thin Solid Films ◽

10.1016/j.tsf.2014.04.089 ◽

2014 ◽

Vol 564 ◽

pp. 232-240 ◽

Cited By ~ 5

Author(s):

A.M. Wrobel ◽

A. Walkiewicz-Pietrzykowska ◽

P. Uznanski

Keyword(s):

Surface Morphology ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

Diamond and Related Materials ◽

10.1016/j.diamond.2006.01.019 ◽

2006 ◽

Vol 15 (10) ◽

pp. 1650-1658 ◽

Cited By ~ 24

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

D.M. Bielinski

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Properties ◽

Remote Hydrogen Microwave Plasma Chemical Vapor Deposition of Amorphous Silicon Carbonitride (a-SiCN) Coatings Derived From Tris(dimethylamino)Silane

Plasma Processes and Polymers ◽

10.1002/ppap.201000203 ◽

2011 ◽

Vol 8 (6) ◽

pp. 542-556 ◽

Cited By ~ 16

Author(s):

Aleksander M. Wrobel ◽

Iwona Blaszczyk-Lezak ◽

Pawel Uznanski ◽

Bartosz Glebocki

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

Self-Organized Microcones Grown on Si Substrate by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.3050 ◽

2008 ◽

Vol 47 (4) ◽

pp. 3050-3052

Author(s):

Masataka Moriya ◽

Yuji Matsumoto ◽

Yoshinao Mizugaki ◽

Tadayuki Kobayashi ◽

Kouichi Usami

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Si Substrate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Self Organized

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Chinese Physics ◽

10.1088/1009-1963/9/7/015 ◽

2000 ◽

Vol 9 (7) ◽

pp. 545-549

Author(s):

Zhang Yong-ping ◽

Gu You-song ◽

Chang Xiang-rong ◽

Tian Zhong-zhuo ◽

Shi Dong-xia ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽