Growth and characterization of silicon nitride films produced by remote microwave plasma chemical vapor deposition

1991 ◽  
Vol 9 (5) ◽  
pp. 2594-2601 ◽  
Author(s):  
D. Landheer ◽  
N. G. Skinner ◽  
T. E. Jackman ◽  
D. A. Thompson ◽  
J. G. Simmons ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Nitride Films

Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH2F2and NH3Source Gases

1991 ◽  
Vol 30 (Part 2, No. 4A) ◽  
pp. L619-L621 ◽  
Author(s):  
Nobuaki Watanabe ◽  
Mamoru Yoshida ◽  
Yi-Chao Jiang ◽  
Tutomu Nomoto ◽  
Ichimatsu Abiko
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Nitride Films

Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition

1993 ◽  
Vol 32 (Part 2, No. 7B) ◽  
pp. L987-L989 ◽  
Author(s):  
Yusuke Mori ◽  
Yoshiyuki Show ◽  
Masahiro Deguchi ◽  
Hiromasa Yagi ◽  
Hiroyuki Yagyu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Diamond Layer
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