Growth and characterization of silicon nitride films produced by remote microwave plasma chemical vapor deposition

D. Landheer; N. G. Skinner; T. E. Jackman; D. A. Thompson; J. G. Simmons; D. V. Stevanovic; D. Khatamian

doi:10.1116/1.577211

Growth and characterization of silicon nitride films produced by remote microwave plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577211 ◽

1991 ◽

Vol 9 (5) ◽

pp. 2594-2601 ◽

Cited By ~ 25

Author(s):

D. Landheer ◽

N. G. Skinner ◽

T. E. Jackman ◽

D. A. Thompson ◽

J. G. Simmons ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films

Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH2F2and NH3Source Gases

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.l619 ◽

1991 ◽

Vol 30 (Part 2, No. 4A) ◽

pp. L619-L621 ◽

Cited By ~ 5

Author(s):

Nobuaki Watanabe ◽

Mamoru Yoshida ◽

Yi-Chao Jiang ◽

Tutomu Nomoto ◽

Ichimatsu Abiko

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.10.018 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 124-127 ◽

Cited By ~ 2

Author(s):

Wei-Chun Chen ◽

Wei-Lin Wang ◽

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Growth and Characterization of the Laterally Enlarged Single Crystal Diamond Grown by Microwave Plasma Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/35/7/078101 ◽

2018 ◽

Vol 35 (7) ◽

pp. 078101 ◽

Cited By ~ 1

Author(s):

Ze-Yang Ren ◽

Jin-Feng Zhang ◽

Jin-Cheng Zhang ◽

Sheng-Rui Xu ◽

Chun-Fu Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Crystal Diamond

Preparation of silicon nitride films at room temperature using double‐tubed coaxial line‐type microwave plasma chemical vapor deposition system

Journal of Applied Physics ◽

10.1063/1.339772 ◽

1987 ◽

Vol 62 (2) ◽

pp. 492-497 ◽

Cited By ~ 21

Author(s):

Isamu Kato ◽

Kazuto Noguchi ◽

Kouji Numada

Keyword(s):

Silicon Nitride ◽

Vapor Deposition ◽

Room Temperature ◽

Microwave Plasma ◽

Chemical Vapor ◽

Coaxial Line ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films ◽

Line Type

Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.02.071 ◽

2010 ◽

Vol 204 (18-19) ◽

pp. 2923-2927 ◽

Cited By ~ 16

Author(s):

M. Matsuoka ◽

S. Isotani ◽

W. Sucasaire ◽

L.S. Zambom ◽

K. Ogata

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Chemical Bonding ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Nitride Films

Diamond growth on silicon nitride by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/0925-9635(92)90107-y ◽

1992 ◽

Vol 1 (7) ◽

pp. 818-823 ◽

Cited By ~ 7

Author(s):

M.C. Salvadori ◽

J.W. Ager ◽

I.G. Brown

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l987 ◽

1993 ◽

Vol 32 (Part 2, No. 7B) ◽

pp. L987-L989 ◽

Cited By ~ 27

Author(s):

Yusuke Mori ◽

Yoshiyuki Show ◽

Masahiro Deguchi ◽

Hiromasa Yagi ◽

Hiroyuki Yagyu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Diamond Layer

Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4825103 ◽

2013 ◽

Vol 103 (15) ◽

pp. 153106 ◽

Cited By ~ 15

Author(s):

Yuki Okigawa ◽

Kazuo Tsugawa ◽

Takatoshi Yamada ◽

Masatou Ishihara ◽

Masataka Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Electrical Characterization ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Graphene Films

Characterization of transport properties of multiwalled carbon nanotube networks by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2006.01.006 ◽

2006 ◽

Vol 15 (4-8) ◽

pp. 1138-1142 ◽

Cited By ~ 3

Author(s):

Yasuhiko Hayashi ◽

T. Tokunaga ◽

K. Kaneko ◽

Z. Horita

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Multiwalled Carbon ◽

Plasma Chemical Vapor Deposition ◽

Carbon Nanotube Networks