Selective growth of CNT by using triode-type radio frequency plasma chemical vapor deposition method

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Formation of Carbon Nitride Films by the Radio-Frequency Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.4893 ◽

1997 ◽

Vol 36 (Part 1, No. 7B) ◽

pp. 4893-4896 ◽

Cited By ~ 17

Author(s):

Mei Zhang ◽

Ping Wang ◽

Yoshikazu Nakayama

Keyword(s):

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.112 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9717-9723 ◽

Cited By ~ 24

Author(s):

Sumita Mukhopadhyay ◽

Swati Ray

Keyword(s):

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Radio‐frequency plasma chemical vapor deposition growth of diamond

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575936 ◽

1989 ◽

Vol 7 (3) ◽

pp. 2325-2327 ◽

Cited By ~ 38

Author(s):

Duane E. Meyer ◽

Rodney O. Dillon ◽

John A. Woollam

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Chemical Vapor Deposition Growth ◽

Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2015.08.017 ◽

2015 ◽

Vol 590 ◽

pp. 299-305 ◽

Cited By ~ 31

Author(s):

D. Batory ◽

A. Jedrzejczak ◽

W. Szymanski ◽

P. Niedzielski ◽

M. Fijalkowski ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Mechanical Characterization ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2006.12.183 ◽

2007 ◽

Vol 515 (13) ◽

pp. 5275-5281 ◽

Cited By ~ 19

Author(s):

Hieronim Szymanowski ◽

Anna Sobczyk-Guzenda ◽

Adam Rylski ◽

Witold Jakubowski ◽

Maciej Gazicki-Lipman ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Tio2 Films ◽

Deposition Method ◽

Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1537717 ◽

2003 ◽

Vol 21 (2) ◽

pp. 515-517 ◽

Cited By ~ 13

Author(s):

Ayako Kimura ◽

Hideyuki Kodama ◽

Tetsuya Suzuki

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Inductively coupled radio frequency plasma chemical vapor deposition using a ladder‐shaped antenna

Review of Scientific Instruments ◽

10.1063/1.1146885 ◽

1996 ◽

Vol 67 (4) ◽

pp. 1542-1545 ◽

Cited By ~ 19

Author(s):

Masayoshi Murata ◽

Yosiaki Takeuchi ◽

Eishiro Sasagawa ◽

Kazutoshi Hamamoto

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Inductively Coupled ◽

Electrical and Optical Properties of Si-Incorporated a-C:H Films via the Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Method

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2016.12216 ◽

2016 ◽

Vol 16 (5) ◽

pp. 5394-5397

Author(s):

In Jun Kim ◽

Won Seok Choi ◽

Byungyou Hong

Keyword(s):

Optical Properties ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Electrical And Optical Properties ◽

Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Cited By ~ 12

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Solar Cell ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition