Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method
1997 ◽
Vol 36
(Part 1, No. 5A)
◽
pp. 2817-2821
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2011 ◽
Vol 257
(23)
◽
pp. 9717-9723
◽
Selective growth of CNT by using triode-type radio frequency plasma chemical vapor deposition method
2007 ◽
Vol 16
(4-7)
◽
pp. 1106-1109
◽
2016 ◽
Vol 16
(5)
◽
pp. 5394-5397
1997 ◽
Vol 36
(Part 1, No. 7B)
◽
pp. 4893-4896
◽
Keyword(s):
2012 ◽
Vol 22
(4)
◽
pp. 190-193
◽
2007 ◽
Vol 16
(2)
◽
pp. 196-201
◽