Electrical and Optical Properties of Si-Incorporated a-C:H Films via the Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Method

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Electrical And Optical Properties ◽

Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.112 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9717-9723 ◽

Cited By ~ 24

Author(s):

Sumita Mukhopadhyay ◽

Swati Ray

Keyword(s):

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2015.08.017 ◽

2015 ◽

Vol 590 ◽

pp. 299-305 ◽

Cited By ~ 31

Author(s):

D. Batory ◽

A. Jedrzejczak ◽

W. Szymanski ◽

P. Niedzielski ◽

M. Fijalkowski ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Mechanical Characterization ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2006.12.183 ◽

2007 ◽

Vol 515 (13) ◽

pp. 5275-5281 ◽

Cited By ~ 19

Author(s):

Hieronim Szymanowski ◽

Anna Sobczyk-Guzenda ◽

Adam Rylski ◽

Witold Jakubowski ◽

Maciej Gazicki-Lipman ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Tio2 Films ◽

Deposition Method ◽

Selective growth of CNT by using triode-type radio frequency plasma chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/j.diamond.2006.11.066 ◽

2007 ◽

Vol 16 (4-7) ◽

pp. 1106-1109 ◽

Cited By ~ 4

Author(s):

Yoshiyuki Show ◽

Norihiko Fukuzumi

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Formation of Carbon Nitride Films by the Radio-Frequency Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.4893 ◽

1997 ◽

Vol 36 (Part 1, No. 7B) ◽

pp. 4893-4896 ◽

Cited By ~ 17

Author(s):

Mei Zhang ◽

Ping Wang ◽

Yoshikazu Nakayama

Keyword(s):

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Electrical and Optical Properties of Ca1-xSrxCuO2Films Prepared by Organometallic Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.l1931 ◽

1991 ◽

Vol 30 (Part 2, No. 11B) ◽

pp. L1931-L1934 ◽

Cited By ~ 13

Author(s):

Kenkichiro Kobayashi ◽

Yozo Ishihara ◽

Shigenori Matsushima ◽

Genji Okada

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organometallic Chemical Vapor Deposition

Deposition Method ◽

Electrical And Optical Properties ◽

Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films

Materials ◽

10.3390/ma7021249 ◽

2014 ◽

Vol 7 (2) ◽

pp. 1249-1260 ◽

Cited By ~ 5

Author(s):

Mateusz Śmietana ◽

Robert Mroczyński ◽

Norbert Kwietniewski

Keyword(s):

Thin Films ◽

Optical Properties ◽

Silicon Nitride ◽

Radio Frequency ◽

Deposition Rate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Low-Temperature Formation of Si-Nanocrystal Dots from Chlorinated Materials by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition and Optical Properties

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.93.275 ◽

2003 ◽

Vol 93 ◽

pp. 275-280

Author(s):

Hajime Shirai ◽

Toru Tsukamoto ◽

Ken-ichi Kurosaki

Keyword(s):

Optical Properties ◽

Low Temperature ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Si Nanocrystal

Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2011.04.032 ◽

2011 ◽

Vol 519 (19) ◽

pp. 6339-6343 ◽

Cited By ~ 32

Author(s):

Mateusz Smietana ◽

Wojtek J. Bock ◽

Jan Szmidt

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Deposition Time ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽