scholarly journals Dataset on the effect of soaking Kale (Brassica Oleraceae L. var. acephala DC.) seeds in solution based on amorphous silicon dioxide on the bioactive components and physiological growth parameters

Data in Brief ◽  
2022 ◽  
pp. 107789
Author(s):  
Ali J. Othman ◽  
Ludmila G. Eliseeva ◽  
Polina G. Molodkina ◽  
Nazirya A. Ibragimova ◽  
Fatima M. Duksi
Keyword(s):  
Silicon Dioxide ◽  
Amorphous Silicon ◽  
Growth Parameters ◽  
Bioactive Components ◽  
Amorphous Silicon Dioxide ◽  
Brassica Oleraceae

scholarly journals THE INFLUENCE OF SILICON DIOXIDE «KOVELOS-SORB» ON GROWTH CHARACHTERISTICS OF RHODODENDRON ROSEUM (LOISEL.) REHDER CULTIVATED IN VITRO

2020 ◽  
pp. 48-55
Author(s):  
Ye. V. Nemtsova ◽  
A. V. Harin ◽  
I. A. Razlugo
Keyword(s):  
Silicon Dioxide ◽  
Amorphous Silicon ◽  
Amorphous Silica ◽  
Culture Medium ◽  
Indoleacetic Acid ◽  
Growth Parameters ◽  
Vast Amount ◽  
Amorphous Silicon Dioxide ◽  
Clonal Micropropagation

The article reveals a stimulating effect of synthetic amorphous silicon dioxide on growth parameters Rhododendron roseum (Loisel.) Rehder, propagating itself in vitro . The purpose of this study was to identify the optimum composition of culture medium on the basis of amorphous silica ‘Kovelos-Sorb’, used for clonal micropropagation of rhododendrons. It was established that it is preferable to add to Anderson culture medium 100 mg/L of amorphous silicon dioxide, which stimulated the growth of mericlone germs Rhododendron roseum (Loisel.) Rehder. In order to stimulate propagation and for receiving a vast amount of propagating material, it was optimal to use Anderson medium which contained 50 mg/L of amorphous silicon dioxide. For establishment of regenerative plants Rhododendron roseum (Loisel.) Rehder in vitro, it was optimal to use Anderson medium which contained synthetic amorphous silicon dioxide in amounts of 50-150 mg/L combined with indoleacetic acid in amounts of 1.5 mg/L.

scholarly journals Сравнительный фотолюминесцентный анализ точечных дефектов в SiO-=SUB=-2-=/SUB=-, индуцированных имплантацией ионов Ar-=SUP=-+-=/SUP=- и облучением нейтронами

2019 ◽  
Vol 45 (5) ◽  
pp. 24
Author(s):  
И.П. Щербаков ◽  
А.Е. Чмель
Keyword(s):  
Silicon Dioxide ◽  
Amorphous Silicon ◽  
Point Defects ◽  
Photoluminescence Spectrum ◽  
Thermal Neutrons ◽  
Optical Transitions ◽  
Atomic Collisions ◽  
Amorphous Silicon Dioxide ◽  
Spectral Bands ◽  
Atomic Nuclei

AbstractThe introduction of Si^+ ions and ions of other elements into amorphous silicon dioxide during their interaction causes damage to the structural bonds, which is observed in the vibrational spectral bands. Pure SiO_2 has no optical transitions but the bands of induced point defects appear in the photoluminescence spectrum when ions/neutrons are introduced. The generation of photoluminescence-active defects by fluxes of Ar^+ ion and thermal neutrons is compared. It is shown that the nature of damage to the structure is associated with both the specifics of the synthesis/processing of the material and the features of the interaction between the substance and ions (atomic collisions) and neutrons (collisions with atomic nuclei).

scholarly journals Model of a switching oxide trap in amorphous silicon dioxide

2001 ◽  
Vol 64 (8) ◽  
Author(s):  
T. Uchino ◽  
M. Takahashi ◽  
T. Yoko
Keyword(s):  
Silicon Dioxide ◽  
Amorphous Silicon ◽  
Amorphous Silicon Dioxide ◽  
Oxide Trap

Thermochemistry of hydride and phenyl groups on the surface of amorphous silicon dioxide

2003 ◽  
Vol 405 (1) ◽  
pp. 73-84 ◽  
Author(s):  
Marek Braun ◽  
Klaus Nestler ◽  
Günter Marx
Keyword(s):  
Silicon Dioxide ◽  
Amorphous Silicon ◽  
Amorphous Silicon Dioxide
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