Effects of a magnetic field on growth of porous alumina films on aluminum

This paper compares two laser-assisted processes developed by the authors for the fabrication of microwave devices based on nanowire arrays loaded inside porous alumina templates. Pros and cons of each process are discussed in terms of accuracy, reproducibility and ease of fabrication. A comparison with lithography technique is also provided. The efficiency of the laser-assisted process is demonstrated through the realization of substrate integrated waveguide (SIW) based devices. A Nanowired SIW line is firstly presented. It operates between 8.5 and 17 GHz, corresponding to the first and second cut-off frequency of the waveguide, respectively. Next, a Nanowired SIW isolator is demonstrated. It shows a nonreciprocal isolation of 12 dB (corresponding to 4.4 dB/cm), observed in absence of a DC magnetic field, and achieved through an adequate positioning of ferromagnetic nanowires inside the waveguide cavity.

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Few nanometer thick anodic porous alumina films on silicon with high density of vertical pores

Thin Solid Films ◽

10.1016/j.tsf.2006.11.022 ◽

2007 ◽

Vol 515 (7-8) ◽

pp. 3602-3606 ◽

Cited By ~ 10

Author(s):

M. Kokonou ◽

K.P. Giannakopoulos ◽

A.G. Nassiopoulou

Keyword(s):

Porous Alumina ◽

High Density ◽

Alumina Films ◽

Anodic Porous Alumina

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Interface traps density of anodic porous alumina films of different thicknesses on Si

Journal of Physics Conference Series ◽

10.1088/1742-6596/10/1/055 ◽

2005 ◽

Vol 10 ◽

pp. 222-225 ◽

Cited By ~ 5

Author(s):

M Theodoropoulou ◽

P K Karahaliou ◽

S N Georga ◽

C A Krontiras ◽

M N Pisanias ◽

...

Keyword(s):

Porous Alumina ◽

Interface Traps ◽

Alumina Films ◽

Anodic Porous Alumina

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Microstructure Control of Porous Alumina Film Using Aqueous Sol Containing Trehalose

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.350.7 ◽

2007 ◽

Vol 350 ◽

pp. 7-10 ◽

Cited By ~ 1

Author(s):

Takeshi Miki ◽

Kaori Nishizawa ◽

Kazuyuki Suzuki ◽

Kazumi Kato

Keyword(s):

Porous Alumina ◽

Dip Coating ◽

Alumina Film ◽

Coating Solution ◽

Coating Technique ◽

Glass Substrates ◽

Alumina Films ◽

Maximum Thickness ◽

Alumina Particles ◽

Dip Coating Technique

To fabricate porous and thick alumina films, we prepared an aqueous alumina hydroxide sol containing trehalose. The alumina films were deposited by dip-coating technique on glass substrates and heating at 500 °C. The maximum thickness of the film obtained by one-run dip-coating using the sol containing trehalose was over 1000 nm. The film was an aggregate of alumina particles with a diameter of 20-40 nm and pores were interstices between the particles. The porosity of alumina film can be controlled in the range of 48-65 % by changing trehalose concentration in the dip-coating solution.

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Preparation of Porous Alumina by Anodization

Journal of Metastable and Nanocrystalline Materials ◽

10.4028/www.scientific.net/jmnm.23.75 ◽

2005 ◽

Vol 23 ◽

pp. 75-78 ◽

Cited By ~ 1

Author(s):

C.X. Xu ◽

X.S. Zhang ◽

X.W. Sun

Keyword(s):

Sulfuric Acid ◽

Oxalic Acid ◽

Acid Solution ◽

Sulfuric Acid Solution ◽

Porous Alumina ◽

Fabrication Process ◽

Alumina Films ◽

Anodization Process

The characteristics of porous alumina produced by anodization in both oxalic acid and sulfuric acid solution have been studied. The diameter of the pores for oxalic acid as electrolyte is about 60 nm and for sulfuric acid as electrolyte is about 30 nm. The morphologies of the pores have been improved by two-step anodization process. It has been observed that the temperature and operation voltage are two of the most important factors in the fabrication process of porous alumina films.

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