Controllable self-rolling of polyurethane/SiO2 film with differential density

2019 ◽  
Vol 119 ◽  
pp. 32-36
Author(s):  
Yaoming Zhang ◽  
Leonid Ionov
Keyword(s):  
Sio2 Film ◽  
Differential Density

SiO2 film growth by ArF laser photolysis of SiH4/N2O mixtures

1991 ◽  
Vol 51 (3-4) ◽  
pp. 171-176 ◽  
Author(s):  
Masaharu Tsuji ◽  
Minoru Sakumoto ◽  
Naoki Itoh ◽  
Hiroshi Obase ◽  
Yukio Nishimura
Keyword(s):  
Film Growth ◽  
Sio2 Film ◽  
Laser Photolysis ◽  
Arf Laser

SiO2 film deposition by XeCl laser ablation of fused silica

1995 ◽  
Vol 86 (1-4) ◽  
pp. 128-133 ◽  
Author(s):  
P. Baeri ◽  
R. Reitano ◽  
N. Marino
Keyword(s):  
Laser Ablation ◽  
Sio2 Film ◽  
Fused Silica ◽  
Film Deposition ◽  
Xecl Laser

Oxide wearout phenomena of ultrathin SiO2 film during high-field stress

1992 ◽  
Vol 28 (16) ◽  
pp. 1516 ◽  
Author(s):  
H. Fukuda ◽  
M. Yasuda ◽  
T. Iwabuchi
Keyword(s):  
High Field ◽  
Sio2 Film ◽  
Field Stress

scholarly journals STM Nano Fabrication Process Using SiO2 Film.

Hyomen Kagaku ◽  
1999 ◽  
Vol 20 (6) ◽  
pp. 435-442
Author(s):  
Hiroshi IWASAKI ◽  
Nan LI ◽  
Tatsuo YOSHINOBU
Keyword(s):  
Sio2 Film ◽  
Fabrication Process ◽  
Nano Fabrication

The Al2O3 gate insulator modified by SiO2 film to improve the performance of IGZO TFTs

2014 ◽  
Vol 69 ◽  
pp. 204-211 ◽  
Author(s):  
Xingwei Ding ◽  
Jianhua Zhang ◽  
Jun Li ◽  
Weimin Shi ◽  
Hao Zhang ◽  
...  
Keyword(s):  
Sio2 Film ◽  
Gate Insulator

Photochemical Lamination of Low Refractive Index Transparent SiO2 Film at Room Temperature for Antireflection Coating

2002 ◽  
Vol 750 ◽  
Author(s):  
Y. Ogawa ◽  
M. Murahara
Keyword(s):  
Refractive Index ◽  
Room Temperature ◽  
Antireflection Coating ◽  
Sio2 Film ◽  
Fused Silica ◽  
Photochemical Reactions ◽  
Atom Density ◽  
Reflection Of Light ◽  
Fused Silica Glass ◽  
Low Refractive Index

ABSTRACTA transparent low refractive index SiO2 film laminated on a glass substrate at room temperature by photochemical reactions with the Xe2* excimer lamp (172nm). This SiO2 film grown on the fused silica glass was proved to avoid reflection of light.A refractive index of the SiO2 film was 1.36. After annealing the film for one hour at 200 degrees centigrade, the refractive index increased to 1.42. The refractive index increased as the F atom density in the SiO 2 film decreased.

Differential density of ground water in ore deposition

1942 ◽  
Vol 37 (5) ◽  
pp. 424-426
Author(s):  
Edwin Thor McKnight
Keyword(s):  
Ground Water ◽  
Differential Density ◽  
Ore Deposition

Preparation of hydrophobic SiO2 film with high transmittance by sol mixing method

2020 ◽  
Vol 747 ◽  
pp. 137331 ◽  
Author(s):  
Yong Wang ◽  
Lifang Nie ◽  
Juncheng Liu
Keyword(s):  
Sio2 Film ◽  
Mixing Method ◽  
Hydrophobic Sio2
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