Photochemical Lamination of Low Refractive Index Transparent SiO2 Film at Room Temperature for Antireflection Coating

2002 ◽  
Vol 750 ◽  
Author(s):  
Y. Ogawa ◽  
M. Murahara
Keyword(s):  
Refractive Index ◽  
Room Temperature ◽  
Antireflection Coating ◽  
Sio2 Film ◽  
Fused Silica ◽  
Photochemical Reactions ◽  
Atom Density ◽  
Reflection Of Light ◽  
Fused Silica Glass ◽  
Low Refractive Index

ABSTRACTA transparent low refractive index SiO2 film laminated on a glass substrate at room temperature by photochemical reactions with the Xe2* excimer lamp (172nm). This SiO2 film grown on the fused silica glass was proved to avoid reflection of light.A refractive index of the SiO2 film was 1.36. After annealing the film for one hour at 200 degrees centigrade, the refractive index increased to 1.42. The refractive index increased as the F atom density in the SiO 2 film decreased.

Photochemical Deposition of Transparent Low Refractive Index SiO2 Topcoat for Laser Head at Room Temperature

2004 ◽  
Vol 843 ◽  
Author(s):  
Y. Tezuka ◽  
M. Murahara
Keyword(s):  
Refractive Index ◽  
Evanescent Wave ◽  
Room Temperature ◽  
Visible Region ◽  
Antireflection Coating ◽  
Mixed Gas ◽  
Laser Head ◽  
Photochemical Deposition ◽  
Glass Slab ◽  
Low Refractive Index

ABSTRACTA transparent, low refractive index SiO 2 film was photo-chemically laminated on a glass slab laser head by the Xe2* excimer lamp in the atmosphere of NF3 and O2 mixed gas at room temperature; which made it possible to inhibit the decrease in the laser output power caused by the evanescent wave leakage.The transparent SiO2 film of 260nm thickness was laminated on the non-heated substrate by the lamp irradiation for one hour. The hardness of the film before annealing was 3 by Mohs’ Scale of Hardness, and its hardness improved to 5 after annealing at 250 degrees centigrade for one hour. The refractive index of the film was 1.42, being lower than the index of silica glass that is 1.46. Furthermore, the transmittance in the visible region increased by 2% with it s antireflection coating.

Waveguide Capillary Cell for Low-Refractive-Index Liquids

1997 ◽  
Vol 51 (10) ◽  
pp. 1554-1558 ◽  
Author(s):  
Robert Altkorn ◽  
Ilia Koev ◽  
Amos Gottlieb
Keyword(s):  
Refractive Index ◽  
Thin Layer ◽  
Reflection Loss ◽  
Total Internal Reflection ◽  
Visible Region ◽  
Fused Silica ◽  
Internal Reflection ◽  
Silica Tube ◽  
Transparent Liquid ◽  
Low Refractive Index

We describe a waveguide capillary cell based on a fused-silica tube coated externally with a thin layer of a low-refractive-index ( n = 1.31) fluoropolymer. When filled with a transparent liquid of refractive index greater than that of the fluoropolymer, the cell is capable of transmitting light through total internal reflection. Loss below 1 dB/m is demonstrated throughout much of the visible region for a 530-μm-i.d., 660-μm-o.d. cell filled with water.

Refractive index spectroscopy and material dispersion in fused silica glass

2020 ◽  
Vol 45 (15) ◽  
pp. 4268
Author(s):  
Yago Arosa ◽  
Raúl de la Fuente
Keyword(s):  
Refractive Index ◽  
Silica Glass ◽  
Fused Silica ◽  
Material Dispersion ◽  
Fused Silica Glass

Nanostructured Transparent Conductive Oxides for Photovoltaic Applications

2013 ◽  
Vol 1493 ◽  
pp. 23-28 ◽  
Author(s):  
Roger E. Welser ◽  
Adam W. Sood ◽  
Jaehee Cho ◽  
E. Fred Schubert ◽  
Jennifer L. Harvey ◽  
...  
Keyword(s):  
Refractive Index ◽  
Indium Tin Oxide ◽  
High Performance ◽  
Antireflection Coating ◽  
Back Surface ◽  
Oblique Angle Deposition ◽  
Wide Range ◽  
Photovoltaic Applications ◽  
Angle Deposition ◽  
Low Refractive Index

ABSTRACTOblique-angle deposition is used to fabricate indium tin oxide (ITO) optical coatings with a porous, columnar nanostructure. Nanostructured ITO layers with a reduced refractive index are then incorporated into antireflection coating (ARC) structures with a step-graded refractive index design, enabling increased transmittance into an underlying semiconductor over a wide range of wavelengths of interest for photovoltaic applications. Low-refractive index nanostructured ITO coatings can also be combined with metal films to form an omnidirectional reflector (ODR) structure capable of achieving high internal reflectivity over a broad spectrum of wavelengths and a wide range of angles. Such conductive high-performance ODR structures on the back surface of a thin-film solar cell can potentially increase both the current and voltage output by scattering unabsorbed and emitted photons back into the active region of the device.

Photochemical laminating of low-refractive-index transparent antireflective SiO2 film

2003 ◽  
Author(s):  
Masataka M. Murahara ◽  
Yasuhiro Ogawa ◽  
Kunio Yoshida ◽  
Yoshiaki Okamoto
Keyword(s):  
Refractive Index ◽  
Sio2 Film ◽  
Low Refractive Index

Room-Temperature Formation of Low Refractive Index Silicon Oxide Films Using Atmospheric-Pressure Plasma

2011 ◽  
Vol 11 (4) ◽  
pp. 2851-2855 ◽  
Author(s):  
Kei Nakamura ◽  
Yoshihito Yamaguchi ◽  
Keiji Yokoyama ◽  
Kosuke Higashida ◽  
Hiromasa Ohmi ◽  
...  
Keyword(s):  
Refractive Index ◽  
Atmospheric Pressure ◽  
Room Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma ◽  
Low Refractive Index

Short-Wave near Infrared Spectra of Liquids in a Waveguide Capillary Sample Cell

1997 ◽  
Vol 5 (1) ◽  
pp. 35-40 ◽  
Author(s):  
Robert Altkorn
Keyword(s):  
Refractive Index ◽  
Near Infrared ◽  
Small Diameter ◽  
Short Wave ◽  
Fused Silica ◽  
Silica Tube ◽  
Sample Cell ◽  
Near Infrared Spectra ◽  
Capillary Sample ◽  
Low Refractive Index

A waveguide capillary cell (WCC) based on a small-diameter fused-silica tube coated externally with a low refractive index ( n = 1.31) fluoropolymer is described, and short-wave near infrared (700–1100 nm) spectra of low refractive index ( n = 1.33–1.38) liquids acquired at cell lengths between 4 and 190 cm are presented. It is shown that the WCC offers low baseline attenuation, sample volumes far smaller than those of conventional long pathlength cells and excellent compatibility with fibre optic spectrometers.

scholarly journals Strong coupling of single quantum dots with low-refractive-index/high-refractive-index materials at room temperature

2020 ◽  
Vol 6 (47) ◽  
pp. eabb3095
Author(s):  
Xingsheng Xu ◽  
Siyue Jin
Keyword(s):  
Quantum Dots ◽  
Refractive Index ◽  
Strong Coupling ◽  
Room Temperature ◽  
High Refractive Index ◽  
Colloidal Quantum Dots ◽  
Rabi Splitting ◽  
Pl Spectra ◽  
Dielectric Cavity ◽  
Low Refractive Index

Strong coupling between a cavity and transition dipole moments in emitters leads to vacuum Rabi splitting. Researchers have not reported strong coupling between a single emitter and a dielectric cavity at room temperature until now. In this study, we investigated the photoluminescence (PL) spectra of colloidal quantum dots on the surface of a SiO2/Si material at various collection angles at room temperature. We measured the corresponding reflection spectra for the SiO2/Si material and compared them with the PL spectra. We observed PL spectral splitting and regarded it as strong coupling between colloidal quantum dots and the SiO2/Si material. Upper polaritons and lower polaritons exhibited anticrossing behavior. We observed Rabi splitting from single-photon emission in the dielectric cavity at room temperature. Through analysis, we attributed the Rabi splitting to strong coupling between quantum dots and bound states in the continuum in the low-refractive-index/high-refractive-index hybrid material.

scholarly journals Preparation of ultra-broadband antireflective coatings for amplifier blast shields by a sol–gel method

2017 ◽  
Vol 5 ◽  
Author(s):  
Huai Xiong ◽  
Bin Shen ◽  
Zhiya Chen ◽  
Xu Zhang ◽  
Haiyuan Li ◽  
...  
Keyword(s):  
Refractive Index ◽  
Sol Gel ◽  
High Refractive Index ◽  
Dip Coating ◽  
Scratch Resistance ◽  
Fused Silica ◽  
Antireflective Coating ◽  
Antireflective Coatings ◽  
Average Residual ◽  
Low Refractive Index

A type of $\unicode[STIX]{x1D706}/4$–$\unicode[STIX]{x1D706}/4$ ultra-broadband antireflective coating has been developed using modified low refractive silica and high refractive silica layers by a sol–gel dip coating method for amplifier blast shields of the Shen Guang II high power laser facility (SG-II facility). Deposition of the first layer (high refractive index silica) involves baking at $200\,^{\circ }\text{C}$ in the post-treatment step. The second layer (low refractive index, $n=1.20$) uses low refractive index silica sol modified by acid catalysis. Thermal baking at temperatures no less than $500\,^{\circ }\text{C}$ for 60 min offers chemical stability, ethanol scratch resistance, and resistance to washing with water. The average residual reflection of dual-side-coated fused silica glass was less than 1% in the spectral range from 450 to 950 nm. Transmission gain has been evaluated by taking into account angular light, and the results show that the transmission gain increases with increasing light incidence. Even at $60^{\circ }$, the transmission spectrum of the broadband antireflective coating effectively covered the main absorption peak of Nd:glass.

Sign in / Sign up

Export Citation Format

Share Document