Isothermal oxidation and hot corrosion behaviors of diffusion aluminide coatings deposited by chemical vapor deposition

2015 ◽  
Vol 637 ◽  
pp. 343-349 ◽  
Author(s):  
Zhenhua Xu ◽  
Jianwei Dai ◽  
Jing Niu ◽  
Limin He ◽  
Rende Mu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Hot Corrosion ◽  
Chemical Vapor ◽  
Isothermal Oxidation ◽  
Aluminide Coatings ◽  
Corrosion Behaviors

Influence of NiCoCrAlY and Diffusion Aluminide Coating on Oxidation and Hot Corrosion of a Ni-Based Superalloy

2007 ◽  
Vol 546-549 ◽  
pp. 1739-1746 ◽  
Author(s):  
Dong Bai Xie ◽  
Sheng Long Zhu ◽  
Wen Jun Dai ◽  
Fu Hui Wang
Keyword(s):  
Vapor Deposition ◽  
Hot Corrosion ◽  
Oxidation Rate ◽  
Physical Vapor Deposition ◽  
Cast Alloy ◽  
Aluminide Coating ◽  
Chemical Vapor ◽  
Isothermal Oxidation ◽  
Flame Spraying ◽  
And Diffusion

The most common metallic coatings used in today’s gas turbine engines are MCrAlX (where M is Ni and/or Co and X is one or more reactive elements such as Y, Hf, etc.) type overlay coatings. However, overlay coating techniques (plasma and flame spraying or physical vapor deposition) are line-of-site processes, and so, it is possible not to deposit coating on some surface of the complex turbine components. The diffusion aluminide coatings can solve this problem. A NiCoCrAlY and diffusion aluminide coating were prepared on K38G cast alloy by multi-arc ion plating and low pressure chemical vapor deposition (LP-CVD) techniques, respectively. The isothermal oxidation behavior of K38G and the coatings was studied in air at 900 and 1000 oC. Their hot corrosion behaviors in the presence of 75 wt.% Na2SO4+K2SO4 and 75wt.%Na2SO4+NaCl film at 900oC were studied. The results showed that the two kinds coatings exhibited low oxidation rate at 900 and 1000oC and the presence of salt accelerated the oxidation rate. The NiCoCrAlY coating showed the better hot corrosion resistance than the aluminide coating.

Characterization and Performance Evaluation of Pack Cementation and Chemical Vapor Deposition Platinum Aluminide Coatings

1996 ◽  
Author(s):  
Zaher Mutasim ◽  
William Brentnall
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Pack Cementation ◽  
Aluminide Coatings ◽  
Platinum Aluminide ◽  
And Performance ◽  
Industrial Gas Turbine ◽  
Metallurgical Evaluation ◽  
Pack Cementation Coating

Metallurgical evaluation of platinum aluminide coatings applied to industrial gas turbine components, for oxidation and high temperature hot corrosion protection, were conducted. Coatings were processed by electroplating a thin layer of platinum followed by aluminizing using either the pack cementation or the chemical vapor deposition (CVD) processes. Laboratory and field data on the performance of these coatings are presented. Results from these tests showed that both aluminizing processes produced coatings that provided adequate environmental protection. However, the CVD coating experienced less coating growth during engine service and was therefore determined to be thermally more stable than the pack cementation coating in this application.

Formation of aluminide coatings on Fe-based alloys by chemical vapor deposition

2008 ◽  
Vol 202 (16) ◽  
pp. 3839-3849 ◽  
Author(s):  
Y. Zhang ◽  
B.A. Pint ◽  
K.M. Cooley ◽  
J.A. Haynes
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Aluminide Coatings

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

The relaxation of compressive biaxial strains in SOS via microtwins

1989 ◽  
Vol 47 ◽  
pp. 608-609
Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Molecular Beam Epitaxy ◽  
Compressive Stress ◽  
Vapor Deposition ◽  
Partial Dislocation ◽  
Molecular Beam ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

Coating of continuous carbon fibers with double layers by chemical vapor deposition

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-885-Pr3-892 ◽  
Author(s):  
N. Popovska ◽  
S. Schmidt ◽  
E. Edelmann ◽  
V. K. Wunder ◽  
H. Gerhard ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Fibers ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Double Layers
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