scholarly journals Structure and morphology of adsorbed protein (BSA) layer on hydrophilic silicon surface in presence of mono-, di- and tri-valent ions

JCIS Open ◽  
2021 ◽  
pp. 100016
Author(s):  
Sanu Sarkar ◽  
Sarathi Kundu
Author(s):  
T. Sato ◽  
S. Kitamura ◽  
T. Sueyoshl ◽  
M. Iwatukl ◽  
C. Nielsen

Recently, the growth process and relaxation process of crystalline structures were studied by observing a SI nano-pyramid which was built on a Si surface with a UHV-STM. A UHV-STM (JEOL JSTM-4000×V) was used for studying a heated specimen, and the specimen was kept at high temperature during observation. In this study, the nano-fabrication technique utilizing the electromigration effect between the STM tip and the specimen was applied. We observed Si atoms migrated towords the tip on a high temperature Si surface.Clean surfaces of Si(lll)7×7 and Si(001)2×l were prepared In the UHV-STM at a temperature of approximately 600 °C. A Si nano-pyramid was built on the Si surface at a tunneling current of l0nA and a specimen bias voltage of approximately 0V in both polarities. During the formation of the pyramid, Images could not be observed because the tip was stopped on the sample. After the formation was completed, the pyramid Image was observed with the same tip. After Imaging was started again, the relaxation process of the pyramid started due to thermal effect.


Author(s):  
O.L. Krivanek ◽  
G.J. Wood

Electron microscopy at 0.2nm point-to-point resolution, 10-10 torr specimei region vacuum and facilities for in-situ specimen cleaning presents intere; ing possibilities for surface structure determination. Three methods for examining the surfaces are available: reflection (REM), transmission (TEM) and profile imaging. Profile imaging is particularly useful because it giv good resolution perpendicular as well as parallel to the surface, and can therefore be used to determine the relationship between the surface and the bulk structure.


1983 ◽  
Vol 44 (2) ◽  
pp. 257-261 ◽  
Author(s):  
B.K. Chakraverty
Keyword(s):  

Author(s):  
U. Kerst ◽  
P. Sadewater ◽  
R. Schlangen ◽  
C. Boit ◽  
R. Leihkauf ◽  
...  

Abstract The feasibility of low-ohmic FIB contacts to silicon with a localized silicidation was presented at ISTFA 2004 [1]. We have systematically explored options in contacting diffusions with FIB metal depositions directly. A demonstration of a 200nm x 200nm contact on source/drain diffusion level is given. The remaining article focuses on the properties of FIB deposited contacts on differently doped n-type Silicon. After the ion beam assisted platinum deposition a silicide was formed using a forming current in two configurations. The electrical properties of the contacts are compared to furnace anneal standards. Parameters of Schottky-barriers and thermal effects of the formation current are studied with numerical simulation. TEM images and material analysis of the low ohmic contacts show a Pt-silicide formed on a silicon surface with no visible defects. The findings indicate which process parameters need a more detailed investigation in order to establish values for a practical process.


2020 ◽  
Vol 12 (3) ◽  
pp. 03024-1-03024-4
Author(s):  
L. V. Poperenko ◽  
◽  
S. G. Rozouvan ◽  
I. V. Yurgelevych ◽  
P. O. Lishchuk ◽  
...  

2019 ◽  
Author(s):  
Virginia Saez-Martinez ◽  
Aisling Mann ◽  
Fiona Lydon ◽  
Frank Molock ◽  
Siân A. Layton ◽  
...  

1999 ◽  
Vol 118 (2) ◽  
pp. 797-816 ◽  
Author(s):  
Daniela Calzetti ◽  
Christopher J. Conselice ◽  
John S. Gallagher III ◽  
Anne L. Kinney

1999 ◽  
Vol 515 (1) ◽  
pp. 97-107 ◽  
Author(s):  
Jing Wang ◽  
Timothy M. Heckman ◽  
Matthew D. Lehnert

2016 ◽  
Vol 50 (1) ◽  
pp. 015206 ◽  
Author(s):  
Max Engelhardt ◽  
Konstantin Kartaschew ◽  
Nikita Bibinov ◽  
Martina Havenith ◽  
Peter Awakowicz

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