Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure

2015 ◽  
Vol 428 ◽  
pp. 86-92 ◽  
Author(s):  
Kristel Möldre ◽  
Lauri Aarik ◽  
Hugo Mändar ◽  
Ahti Niilisk ◽  
Raul Rammula ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Film Structure ◽  
Substrate Orientation ◽  
Thin Film Structure ◽  
Layer Deposition ◽  
Influence Of Substrate

Control of thin film structure by reactant pressure in atomic layer deposition of TiO2

1996 ◽  
Vol 169 (3) ◽  
pp. 496-502 ◽  
Author(s):  
Jaan Aarik ◽  
Aleks Aidla ◽  
Väino Sammelselg ◽  
Hele Siimon ◽  
Teet Uustare
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Film Structure ◽  
Thin Film Structure ◽  
Layer Deposition

Electrochemical Atomic Layer Deposition of CdS on Ag Single Crystals: Effects of Substrate Orientation on Film Structure

2014 ◽  
Vol 118 (12) ◽  
pp. 6132-6139 ◽  
Author(s):  
Francesco Carlà ◽  
Francesca Loglio ◽  
Andrea Resta ◽  
Roberto Felici ◽  
Elisa Lastraioli ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystals ◽  
Atomic Layer ◽  
Film Structure ◽  
Substrate Orientation ◽  
Layer Deposition

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

2013 ◽  
Vol 542 ◽  
pp. 219-224 ◽  
Author(s):  
Väino Sammelselg ◽  
Ivan Netšipailo ◽  
Aleks Aidla ◽  
Aivar Tarre ◽  
Lauri Aarik ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Chemical Resistance ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

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