Hot-wall low pressure chemical vapor deposition growth and characterization of AlN thin films

2017 ◽  
Vol 475 ◽  
pp. 286-290 ◽  
Author(s):  
Karen N. Heinselman ◽  
Richard J. Brown ◽  
James R. Shealy
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposition Growth ◽  
Pressure Chemical

Ex situellipsometry characterization of excimer laser annealed amorphous silicon thin films grown by low pressure chemical vapor deposition

1997 ◽  
Vol 71 (3) ◽  
pp. 359-361 ◽  
Author(s):  
Chau-Hong Kuo ◽  
In-Cha Hsieh ◽  
Dieter K. Schroder ◽  
George N. Maracas ◽  
Sheau Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Thin Films ◽  
Pressure Chemical

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

2017 ◽  
Vol 19 (8) ◽  
pp. 1700193 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection

scholarly journals Characterization of TiN film grown by low-pressure-chemical-vapor-deposition

1997 ◽  
Vol 308-309 ◽  
pp. 594-598 ◽  
Author(s):  
Y.J Mei ◽  
T.C Chang ◽  
J.C Hu ◽  
L.J Chen ◽  
Y.L Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Tin Film ◽  
Pressure Chemical
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