Simulation of diamond synthesis by microwave plasma chemical vapor deposition with multiple substrates in a substrate holder

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2021.126457 ◽

2021 ◽

pp. 126457

Author(s):

Lin Li ◽

Chengchun Zhao ◽

Shulong Zhang ◽

Qiaorui Gong ◽

Xiaohui Sun ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Substrate Holder ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Multiple Substrates

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The Effect of a Graphite Holder on Diamond Synthesis by Microwave Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069256 ◽

1992 ◽

Vol 139 (2) ◽

pp. 558-560 ◽

Author(s):

M. C. Salvadori ◽

M. A. Brewer ◽

J. W. Ager ◽

K. M. Krishnan ◽

I. G. Brown

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Diamond synthesis via CH metal precursors processed in hot filament chemical vapor deposition and microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01327-4 ◽

2000 ◽

Vol 377-378 ◽

pp. 274-279 ◽

Author(s):

Ming-Show Wong ◽

Chung-An Lu ◽

Hsiao-Kho Chang ◽

Tien-Syh Yang ◽

Jane-How Wu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Metal Precursors ◽

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Diamond synthesis by microwave plasma chemical vapor deposition using graphite as the carbon source

Applied Physics Letters ◽

10.1063/1.106024 ◽

1991 ◽

Vol 59 (19) ◽

pp. 2386-2388 ◽

Author(s):

M. C. Salvadori ◽

J. W. Ager ◽

I. G. Brown ◽

K. M. Krishnan

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Source ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Diamond Synthesis by Microwave-Plasma Chemical Vapor Deposition Using CH3Cl and CH2Cl2as Carbon Source

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.5067 ◽

1993 ◽

Vol 32 (Part 1, No. 11A) ◽

pp. 5067-5071 ◽

Author(s):

Takayuki Nagano ◽

Noriyoshi Shibata

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Source ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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The role of hydrogen in diamond synthesis from carbon dioxide-hydrocarbon gases by microwave plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(07)80050-8 ◽

1992 ◽

Vol 54-55 ◽

pp. 368-373 ◽

Author(s):

Chia-Fu Chen ◽

Tsao-Ming Hong

Keyword(s):

Carbon Dioxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Plasma Chemical ◽

Hydrocarbon Gases ◽

Plasma Chemical Vapor Deposition

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The role of hydrogen in diamond synthesis from carbon dioxide–hydrocarbon gases by microwave plasma chemical vapor deposition

Metallurgical Coatings and Thin Films 1992 ◽

10.1016/b978-0-444-89900-2.50067-1 ◽

1992 ◽

pp. 368-373

Author(s):

Chia-Fu Chen ◽

Tsao-Ming Hong

Keyword(s):

Carbon Dioxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Synthesis ◽

Plasma Chemical ◽

Hydrocarbon Gases ◽

Plasma Chemical Vapor Deposition

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HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Self-Organized Microcones Grown on Si Substrate by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.3050 ◽

2008 ◽

Vol 47 (4) ◽

pp. 3050-3052

Author(s):

Masataka Moriya ◽

Yuji Matsumoto ◽

Yoshinao Mizugaki ◽

Tadayuki Kobayashi ◽

Kouichi Usami

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Si Substrate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Chinese Physics ◽

10.1088/1009-1963/9/7/015 ◽

2000 ◽

Vol 9 (7) ◽

pp. 545-549

Author(s):

Zhang Yong-ping ◽

Gu You-song ◽

Chang Xiang-rong ◽

Tian Zhong-zhuo ◽

Shi Dong-xia ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Lateral outward growth of single-crystal diamond by two different structures of microwave plasma reactors

CrystEngComm ◽

10.1039/d1ce01373d ◽

2022 ◽

Author(s):

Wei Cao ◽

Zhibin Ma ◽

Hongyang Zhao ◽

Deng Gao ◽

Qiuming Fu

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Lateral Growth ◽

Plasma Reactors ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Crystal Diamond

On a semi-open holder, the homoepitaxial lateral growth of single-crystal diamond (SCD) was carried out via microwave plasma chemical vapor deposition (MPCVD). By tuning and optimizing two different structures of...

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