H2 annealing effect on the structural and electrical properties of amorphous InGaZnO films for thin film transistors

2013 ◽  
Vol 378 ◽  
pp. 50-54 ◽  
Author(s):  
Yuanjie Li ◽  
Zilong Liu ◽  
Kai Jiang ◽  
Xiaofen Hu
2014 ◽  
Vol 558 ◽  
pp. 279-282 ◽  
Author(s):  
Jae-Sung Kim ◽  
Min-Kyu Joo ◽  
Ming Xing Piao ◽  
Seung-Eon Ahn ◽  
Yong-Hee Choi ◽  
...  

RSC Advances ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 5622-5628 ◽  
Author(s):  
Yunyong Nam ◽  
Hee-Ok Kim ◽  
Sung Haeng Cho ◽  
Sang-Hee Ko Park

We fabricated amorphous InGaZnO thin film transistors (a-IGZO TFTs) with aluminum oxide (Al2O3) as a gate insulator grown through atomic layer deposition (ALD) method at different deposition temperatures (Tdep).


2015 ◽  
Vol 334 ◽  
pp. 129-137 ◽  
Author(s):  
P. Chelvanathan ◽  
Z. Zakaria ◽  
Y. Yusoff ◽  
M. Akhtaruzzaman ◽  
M.M. Alam ◽  
...  

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