Estimating The Economic Consequences Of An Increased Medication Compliance Due To A Potential Improvement Of The Inhaler Technique With Spiromax® Compared With Turbuhaler® In Moderate To Severe Patients With Copd In Spain

Abstract:Long acting injectable (LAI) antipsychotics are indicated for individuals suffering from schizophrenia, delusional disorder, schizoaffective disorder and bipolar disorder. Even though LAIs have traditionally been used for a subgroup of patients who were not compliant with oral treatments or who were a high risk to others, current trends are changing with increased options and availability of these treatments. A number of factors are implicated in the reversal of this trend including perspectives of patients and perspectives of providers. There is not abundant literature available regarding robust studies to examine these perspectives, but this presentation provides a current summary of available literature.Some factors that influence perspectives of both patients and providers include knowledge about LAIs, cost of LAIs and the traditional views of these agents as being used under coercive circumstances. Altering perspectives has been a primary barrier to increase the use of these agents. Evidence clearly supports the use of early intervention for individuals with first episode psychosis, and poor medication compliance results in poorer treatment outcomes. With the potential improvement in quality of life and potentially decreasing the cost burden of this illness in society, this avenue for treatment must be a strong consideration for all involved in the treatment of the aforementioned disorders.

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Identification of factors involved in medication compliance: incorrect inhaler technique of asthma treatment leads to poor compliance

Patient Preference and Adherence ◽

10.2147/ppa.s95303 ◽

2016 ◽

pp. 135 ◽

Cited By ~ 7

Author(s):

Josep Darba ◽

Gabriela Ramírez ◽

Laura García-Bujalance ◽

Saku Torvinen ◽

Rainel Sánchez-de la Rosa ◽

...

Keyword(s):

Medication Compliance ◽

Poor Compliance ◽

Inhaler Technique ◽

Asthma Treatment

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The stabilization of B.C.C. Cu in Cu/Nb nanolayered composites

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100163605 ◽

1996 ◽

Vol 54 ◽

pp. 228-229

Author(s):

H. Kung ◽

A.J. Griffin ◽

Y.C. Lu ◽

K.E. Sickafus ◽

T.E. Mitchell ◽

...

Keyword(s):

Electrical Resistivity ◽

Layer Thickness ◽

Volume Fraction ◽

Ion Beam ◽

High Strength ◽

Cross Sectional ◽

Metastable Structure ◽

High Resolution Tem ◽

Potential Improvement ◽

Two Phases

Materials with compositionally modulated structures have gained much attention recently due to potential improvement in electrical, magnetic and mechanical properties. Specifically, Cu-Nb laminate systems have been extensively studied mainly due to the combination of high strength, and superior thermal and electrical conductivity that can be obtained and optimized for the different applications. The effect of layer thickness on the hardness, residual stress and electrical resistivity has been investigated. In general, increases in hardness and electrical resistivity have been observed with decreasing layer thickness. In addition, reduction in structural scale has caused the formation of a metastable structure which exhibits uniquely different properties. In this study, we report the formation of b.c.c. Cu in highly textured Cu/Nb nanolayers. A series of Cu/Nb nanolayered films, with alternating Cu and Nb layers, were prepared by dc magnetron sputtering onto Si {100} wafers. The nominal total thickness of each layered film was 1 μm. The layer thickness was varied between 1 nm and 500 nm with the volume fraction of the two phases kept constant at 50%. The deposition rates and film densities were determined through a combination of profilometry and ion beam analysis techniques. Cross-sectional transmission electron microscopy (XTEM) was used to examine the structure, phase and grain size distribution of the as-sputtered films. A JEOL 3000F high resolution TEM was used to characterize the microstructure.

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“Getting High Resolution Out of A High Voltage Microscope”

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s143192760000355x ◽

1980 ◽

Vol 38 ◽

pp. 822-825

Author(s):

David J. Smith

Keyword(s):

Electron Microscope ◽

High Resolution ◽

High Voltage ◽

Theoretical Limit ◽

Voltage Electron ◽

High Voltage Electron Microscope ◽

High Voltage Electron ◽

Technological Advances ◽

Potential Improvement ◽

Lower Voltage

The initial attractions of the high voltage electron microscope (HVEM) stemmed mainly from the possibility of considerable increases in electron penetration through thick specimens compared with conventional 100KV microscopes, although the potential improvement in resolution associated with the decrease in election wavelength had been fully appreciated for many years (eg. Cosslett, 1946)1, even if not realizable in practice. Subsequent technological advances enabled the performance of lower voltage machines to be brought closer to the theoretical limit, to be followed in turn by more recent projects which have been successful, eventually, in achieving even higher resolution with dedicated higher voltage instruments such as those at Kyoto (500KV)2, Munich (400KV)3, Ibaraki (1250KV)4 and Cambridge (600KV)5. It does not necessarily follow however that the performance of journal high voltage microscopes can be easily upgraded, retrospectively, to the same level, as will be discussed in detail below.

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