EFFECT OF OXYGEN BASED FUNCTIONAL GROUPS ON THE NUCLEATION OF TiO2 BY ATOMIC LAYER DEPOSITION: A THEORETICAL AND EXPERIMENTAL STUDY.

2021 ◽  
pp. 124588
Author(s):  
H.A. Borbón-Nuñez ◽  
Jesús Muñiz ◽  
A.G. El Hachimi ◽  
D. Frausto-Silva ◽  
J.L. Gutiérrez-Díaz ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Functional Groups ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Effect Of Oxygen

scholarly journals Electrochemical Evaluation of Surface Modified Free-Standing CNT Electrode for Li–O2 Battery Cathode

Energies ◽  
2021 ◽  
Vol 14 (14) ◽  
pp. 4196
Author(s):  
Ji Hyeon Lee ◽  
Hyun Wook Jung ◽  
In Soo Kim ◽  
Min Park ◽  
Hyung-Seok Kim
Keyword(s):  
Functional Groups ◽  
Atomic Layer ◽  
Free Standing ◽  
Coating Technology ◽  
Oxygen Functional Groups ◽  
Layer Deposition ◽  
Discharge Product ◽  
Effect Of Oxygen ◽  
Surface Modified ◽  
Electrochemical Evaluation

In this study, carbon nanotubes (CNTs) were used as cathodes for lithium–oxygen (Li–O2) batteries to confirm the effect of oxygen functional groups present on the CNT surface on Li–O2 battery performance. A coating technology using atomic layer deposition was introduced to remove the oxygen functional groups present on the CNT surface, and ZnO without catalytic properties was adopted as a coating material to exclude the effect of catalytic reaction. An acid treatment process (H2SO4:HNO3 = 3:1) was conducted to increase the oxygen functional groups of the existing CNTs. Therefore, it was confirmed that ZnO@CNT with reduced oxygen functional groups lowered the charging overpotential by approximately 230 mV and increased the yield of Li2O2, a discharge product, by approximately 13%. Hence, we can conclude that the ZnO@CNT is suitable as a cathode material for Li–O2 batteries.

Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

2012 ◽  
Vol 30 (1) ◽  
pp. 01A115 ◽  
Author(s):  
Maarit Kariniemi ◽  
Jaakko Niinistö ◽  
Marko Vehkamäki ◽  
Marianna Kemell ◽  
Mikko Ritala ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Deposition Processes

scholarly journals Proton Exchange Membrane Fuel Cell Flooding Caused by Residual Functional Groups after Platinum Atomic Layer Deposition

2017 ◽  
Vol 237 ◽  
pp. 192-198 ◽  
Author(s):  
Alia M. Lubers ◽  
William W. McNeary ◽  
Daryl J. Ludlow ◽  
Austin W. Drake ◽  
Matthias Faust ◽  
...  
Keyword(s):  
Fuel Cell ◽  
Atomic Layer Deposition ◽  
Functional Groups ◽  
Proton Exchange Membrane ◽  
Atomic Layer ◽  
Proton Exchange ◽  
Layer Deposition ◽  
Residual Functional ◽  
Exchange Membrane

scholarly journals Adsorption of Titanium Halides on Nitride and Oxide Surfaces during Atomic Layer Deposition: A DFT Study

Coatings ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 712
Author(s):  
Jeongwoo Park ◽  
Neung Kyung Yu ◽  
Donghak Jang ◽  
Eunae Jung ◽  
Hyunsik Noh ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Functional Groups ◽  
Density Functional ◽  
Substrate Surface ◽  
Atomic Layer ◽  
Dissociative Adsorption ◽  
Reaction Rate Constant ◽  
Dft Study ◽  
Layer Deposition

Various processes based on atomic layer deposition (ALD) have been reported for growing Ti-based thin films such as TiN and TiO2. To improve the uniformity and conformity of thin films grown via ALD, fundamental understanding of the precursor–substrate surface reactions is required. Herein, we present a density functional theory (DFT) study of the initial nucleation process of some titanium halide precursors (TiCl4, TiBr4, and TiI4) on Si surfaces having –OH or –NH2 functional groups. We consider the most favorable adsorption site in the reaction between the precursor and functional group of the surface, based on the thermodynamics and kinetics of the reaction. Sequential dissociation reaction mechanisms of halide ligands were systematically investigated. The exothermicity of the dissociative adsorption was found to be in the order of: TiI4 > TiBr4 > TiCl4. In addition, the precursors were observed to be more exothermic and show higher reaction rate constant when adsorbed on the –OH–terminated surface than on the –NH2–terminated surface. These observations reveal the selectivity of deposition by surface functional groups.

scholarly journals Continuous and ultrathin platinum films on graphene using atomic layer deposition: a combined computational and experimental study

Nanoscale ◽  
2016 ◽  
Vol 8 (47) ◽  
pp. 19829-19845 ◽  
Author(s):  
Bora Karasulu ◽  
René H. J. Vervuurt ◽  
Wilhelmus M. M. Kessels ◽  
Ageeth A. Bol
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Silicon Atomic Layer Deposition on Nanocrystalline Diamond

2006 ◽  
Vol 315-316 ◽  
pp. 436-439
Author(s):  
Yan Hui Wang ◽  
Jing Lu ◽  
X.H. Qi ◽  
Jian Bing Zang
Keyword(s):  
Atomic Layer Deposition ◽  
Functional Groups ◽  
Single Phase ◽  
Silicon Film ◽  
Atomic Layer ◽  
High Resolution Electron Microscopy ◽  
Nanocrystalline Diamond ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Resolution Electron

Single-phase nanocrystalline diamond composite is very difficult to sinter because of a huge amount of oxygen-containing and nitrogen-containing functional groups adsorbed on the surface of nanocrystalline diamond going against the yielding of diamond-to-diamond bonding. In this paper, silicon film was deposited on nanocrystalline diamond by means of atomic layer deposition (ALD) using silane as precursor, which would promote the sintering of nanocrystalline diamond as the bond. The structure and the morphology of Si-deposited nanocrystalline diamond were thoroughly studied by X-ray diffraction (XRD), high-resolution electron microscopy (HREM) and Fourier transform infrared (FTIR) spectra. The results confirmed that silicon film grew uniformly on every primary particle and functional groups adsorbed on the surface of nanocrystalline diamond were removed by this method.

scholarly journals Distribution of oxygen functional groups of graphene oxide obtained from low-temperature atomic layer deposition of titanium oxide

RSC Advances ◽  
2017 ◽  
Vol 7 (23) ◽  
pp. 13979-13984 ◽  
Author(s):  
Dong Seok Shin ◽  
Hyun Gu Kim ◽  
Ho Seon Ahn ◽  
Hu Young Jeong ◽  
Youn-Jung Kim ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Functional Groups ◽  
Atomic Layer ◽  
Oxide Surface ◽  
Oxygen Functional Groups ◽  
Layer Deposition

The island-like distribution of the oxygen functional groups of graphene oxide was identified by deposition of TiO2 on the graphene oxide surface using low-temperature atomic layer deposition.

Unravelling the selective growth mechanism of AlOx with dimethylaluminum isopropoxide as a precursor in atomic layer deposition: a combined theoretical and experimental study

2020 ◽  
Vol 8 (8) ◽  
pp. 4308-4317 ◽  
Author(s):  
Jiaqiang Yang ◽  
Kun Cao ◽  
Quan Hu ◽  
Yanwei Wen ◽  
Xiao Liu ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Atomic Layer ◽  
Selective Growth ◽  
Layer Deposition ◽  
Nano Catalysts

The selective encapsulation of Pt nano catalysts is achieved to maintain the durability and reactivity.

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