Large area silicon epitaxy using pulsed DC magnetron sputtering deposition
2008 ◽
Vol 85
(3)
◽
pp. 636-639
◽
P. Plantin
◽
F. Challali
◽
O. Carriot
◽
F. Lainat
◽
M. Ancilotti
◽
...
2008 ◽
Vol 517
(1)
◽
pp. 369-371
◽
A. Ben Abdelmoumen
◽
R. Cherfi
◽
M. Kechoune
◽
M. Aoucher
2019 ◽
Vol 35
(2)
◽
pp. 025004
◽
Wei-Sheng Liu
◽
Chien-Lung Huang
◽
Yi-Hung Lin
◽
Chih-Hao Hsu
◽
Yi-Ming Chu
2001 ◽
Vol 46
(13-14)
◽
pp. 1931-1936
◽
C. Brigouleix
◽
P. Topart
◽
E. Bruneton
◽
F. Sabary
◽
G. Nouhaut
◽
...
Xiang Dong
◽
Yuanjie Su
◽
Zhiming Wu
◽
Xiangdong Xu
◽
Zihao Xiang
◽
...
2014 ◽
Vol 212
(1)
◽
pp. 42-46
◽
Louise R. Bailey
◽
Gary Proudfoot
◽
Brodie Mackenzie
◽
Niels Andersen
◽
Arne Karlsson
◽
...
2017 ◽
Vol 71
◽
pp. 188-196
◽
Marina Ratova
◽
Rachan Klaysri
◽
Piyasan Praserthdam
◽
Peter J. Kelly
2021 ◽
Vol 188
◽
pp. 110200
Sihui Wang
◽
Wei Wei
◽
Yonghao Gao
◽
Haibin Pan
◽
Yong Wang
2012 ◽
Vol 86
(10)
◽
pp. 1423-1427
◽
Ji-Hyeon Park
◽
Beom-Ki Shin
◽
Hong-Man Moon
◽
Min-Jung Lee
◽
Kang-Il Park
◽
...
2013 ◽
Vol 586
(1)
◽
pp. 168-178
Hyun Gon Oh
◽
Kyung Soo Kim
◽
Jimi Eom
◽
Sang Jik Kwon
◽
Eou Sik Cho
◽
...
2014 ◽
Vol 60
◽
pp. 148-155
◽
B. Grew
◽
J.W. Bowers
◽
F. Lisco
◽
N. Arnou
◽
J.M. Walls
◽
...