Hydrogenated amorphous silicon deposited by pulsed DC magnetron sputtering. Deposition temperature effect
2019 ◽
Vol 35
(2)
◽
pp. 025004
◽
2009 ◽
Vol 206
(7)
◽
pp. 1504-1509
◽
2001 ◽
Vol 46
(13-14)
◽
pp. 1931-1936
◽
2008 ◽
Vol 85
(3)
◽
pp. 636-639
◽
2006 ◽
Vol 9
(4-5)
◽
pp. 690-693
◽
2012 ◽
Vol 259
◽
pp. 596-599
◽
2014 ◽
Vol 11
(11-12)
◽
pp. 1714-1717
◽
2001 ◽
Vol 383
(1-2)
◽
pp. 192-195
◽