Impact of phosphonium-based ionic liquid on the corrosion control of aluminum alloy AA5052 in MED desalination plants during acid cleaning process

2021 ◽  
Vol 334 ◽  
pp. 116121
Author(s):  
M.A. Deyab ◽  
Q. Mohsen
Author(s):  
Pobitra Halder ◽  
Savankumar Patel ◽  
Sazal Kundu ◽  
Biplob Pramanik ◽  
Rajarathinam Parthasarathy ◽  
...  

CORROSION ◽  
10.5006/2815 ◽  
2018 ◽  
Vol 74 (9) ◽  
pp. 1023-1032
Author(s):  
Dannisa R. Chalfoun ◽  
Mariano A. Kappes ◽  
Mauricio Chocrón ◽  
Raul B. Rebak

Aluminum alloy UNS A95052 (AA5052) is very attractive for desalination applications because of its good corrosion resistance in seawater at temperatures up to 125°C, low cost, good thermal conductivity, and non-toxicity of its corrosion products. The pitting corrosion potential, Epit, and the pit repassivation potential, Er,pit, of AA5052 were measured in deaerated 65,000 ppm sodium chloride (NaCl) solutions at 30°C, 60°C, and 85°C. Epit decreased with temperature, in accord with literature results. Er,pit was a function of anodic charge passed during pit growth stage. A complete evaluation of suitability of this alloy from a corrosion perspective requires also studies of crevice corrosion at different temperatures, considering that multi-plate designs of desalinators have metal plates in contact with rubber gaskets and seals. Cyclic potentiodynamic polarization was used to estimate crevice repassivation potentials, Er,crev, at 30°C, 60°C, and 85°C, in specimens with an attached rubber O-ring as a crevice former. This crevice former simulated the partially occluded geometry expected in desalination plants. Stable crevice corrosion potentials, Ecrev, were similar to Epit, and, when polarized to a similar anodic charge density, Er,crev were similar to Er,pit. Based on this result, from a corrosion perspective, the presence of crevices in the desalination plant is not expected to present an additional risk during operation of the plant. Electrochemical tests were also performed in saturated AlCl3 solutions to explain the results using Galvele’s localized acidification model.


Author(s):  
Miguel A. Gutierrez ◽  
Michael Gydesen ◽  
Caitlin Marcellus ◽  
Ivan Puchades ◽  
Brian Landi ◽  
...  

In this study, the tribological behavior of the Trihexyl tetradecylphosphonium-bis(2,4,4-trimethylpentyl)phosphinate [THTDP][Phos] ionic liquid with and without single-wall carbon nanotubes (SWCNT) dispersion as a thin boundary layer was intended for investigation. However, the surface heat treatment process was not sufficient to form a thin film on the sample surfaces. Thus, in each test condition, the lubricating agents were used as external (liquid) lubricants. Specifically, [THTDP][Phos] and ([THTDP][Phos]+0.1 wt.% SWCNT) boundary film layers were applied on 6061-T6 aluminum alloy disk samples and tested under sliding contact with 1.5 mm diameter 420C stainless steel balls using a ball-on-flat linearly reciprocating tribometer. A commercially available Mobil Super 10W-40 engine oil (MS10W40) was also tested and used as this investigation’s datum. The tribological behavior of [THTDP][Phos] and ([THTDP][Phos]+SWCNT) boundary film layers was analyzed via wear volume calculations from optical microscopy measurements, as well as by observation of the transient coefficient of friction (COF) obtained through strain gauge measurements made directly from the reciprocating member of the tribometer. Results indicate the potential for reduction of wear volume and coefficient of friction in the IL lubricated steel-on-aluminum sliding contact through (SWCNT) dispersion in the ionic liquid. Wear results are based on measurements obtained using optical microscopy (OM). Results discussed display improved tribological performance for both [THTDP][Phos] and ([THTDP][Phos]+SWCNT) over baseline MS10W40 oil lubricant for both roughness values tested for the steel-on-aluminum contact. No measurable improvements were observed between [THTDP][Phos] and ([THTDP][Phos]+SWCNT) tests.


2019 ◽  
Vol 105 (5-6) ◽  
pp. 2481-2490 ◽  
Author(s):  
Guangxing Zhang ◽  
Xueming Hua ◽  
Fang Li ◽  
Yuelong Zhang ◽  
Chen Shen ◽  
...  

1997 ◽  
Vol 477 ◽  
Author(s):  
Hitoshi Morinaga ◽  
Masumi Aoki ◽  
Toshiaki Maeda ◽  
Masaya Fujisue

ABSTRACTNH4OH/H2O2/H2O (called APM or SC–1) cleaning combined with megasonic irradiation is found to feature outstanding removal efficiency for various types of particulate contaminant. The conventional APM cleaning, however, allows metallic impurity in solution to adhere onto substrate surface, and it must be followed by acid cleaning such as HCI/IH2O2/H2O (called HPM or SC–2) cleaning to remove metallic impurity from substrate. The advanced APM cleaning using MC–1 which is alkali cleaning agent containing chelating agent has been developed, and this new cleaning is found capable for preventing various metallic impurities including Al in solution from contaminating substrate surface. Besides, with cleaning conditions optimized, the advanced APM cleaning using MC–1 can also remove metallic impurity from substrate surface. In short, this modified APM cleaning is capable for removing particle and metallic impurity at the same time, which is not possible with the conventional cleaning technology. The cleaning process of semiconductor manufacturing process can be simplified if HPM cleaning is eliminated by introducing the advanced APM cleaning using MC–1. This leads to drastic reduction of cleaning cost and improvement of throughput of the cleaning process.


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