Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

2011 ◽  
Vol 176 (11) ◽  
pp. 850-854 ◽  
Author(s):  
Qinghua Kong ◽  
Li Ji ◽  
Hongxuan Li ◽  
Xiaohong Liu ◽  
Yongjun Wang ◽  
...  
Keyword(s):  
Residual Stress ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Medium Frequency ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate

Influence of Substrate Bias Voltage on Properties of Medium-Frequency Magnetron Sputtering WS2 Soft Coatings

2012 ◽  
Vol 229-231 ◽  
pp. 2427-2431
Author(s):  
Yun Song Lian ◽  
Jian Xin Deng ◽  
Shi Peng Li ◽  
Guang Yuan Yan ◽  
Hong Wei Cheng
Keyword(s):  
Magnetron Sputtering ◽  
Critical Load ◽  
Bias Voltage ◽  
Ion Beam ◽  
Substrate Bias ◽  
Coating Properties ◽  
Medium Frequency ◽  
Substrate Bias Voltage ◽  
Fine Grained ◽  
Fine Grained Structure

WS2 soft coatings were deposited by medium-frequency magnetron sputtering, multi-arc ion plating and ion beam assisted deposition technique on the YT15 cemented carbide substrates. The influence of the substrate bias voltage on the coating properties has been studied. The coatings exhibited a dense and fine grained structure. WS2 soft coatings with substrate bias voltage of -100 V revealed a better coating properties than other four samples, as the best crystallization of (002) preferred crystal orientation of Ⅱ texture, the most smooth and uniform microstructure of the coating, the largest critical load of 43.25 N and the largest coating thickness of 1.5 μm. But the microhardness of sample S1 was only 515.4 Hv. The critical load and the thickness of WS2 coatings decreased firstly, then increased, and finally reduced with the increasement of substrate bias voltage. And the microhardness of the coatings decreased firstly, then increased, and decreased, finally increased with the increasement of substrate bias voltage.

Influence of substrate bias voltage on the properties of sputtered nickel oxide thin films

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Oxide Thin Films ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate ◽  
Nickel Oxide Thin Films

Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering

2007 ◽  
Vol 253 (17) ◽  
pp. 7192-7196 ◽  
Author(s):  
M. Flores ◽  
L. Huerta ◽  
R. Escamilla ◽  
E. Andrade ◽  
S. Muhl
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage
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