Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering

2018 ◽  
Vol 76 ◽  
pp. 80-86 ◽  
Author(s):  
M. Chandra Sekhar ◽  
N. Nanda Kumar Reddy ◽  
B. Purusottam Reddy ◽  
B. Poorna Prakash ◽  
Harish Sharma Akkera ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Electronic Properties ◽  
Schottky Barrier ◽  
Bias Voltage ◽  
Crystallographic Structure ◽  
Substrate Bias ◽  
Dc Magnetron Sputtering ◽  
Substrate Bias Voltage ◽  
Optical And Electronic Properties ◽  
Influence Of Substrate

Influence of substrate bias voltage on the properties of sputtered nickel oxide thin films

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Oxide Thin Films ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate ◽  
Nickel Oxide Thin Films
Sign in / Sign up

Export Citation Format

Share Document