scholarly journals Formation of silicon nanocrystals by thermal annealing of low-pressure chemical-vapor deposited amorphous SiNx (x=0.16) thin films

2013 ◽  
Vol 16 (6) ◽  
pp. 1849-1852 ◽  
Author(s):  
Hakim Haoues ◽  
Hachemi Bouridah ◽  
Mahmoud Riad Beghoul ◽  
Farida Mansour ◽  
Riad Remmouche ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Silicon Nanocrystals ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

2017 ◽  
Vol 19 (8) ◽  
pp. 1700193 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection
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