Dose-rate and temperature dependent statistical damage accumulation model for ion implantation into silicon

Author(s):  
J.M. Hernández-Mangas ◽  
J. Arias ◽  
L.A. Marqués ◽  
A. Ruiz-Bueno ◽  
L. Bailón
Author(s):  
A. I. Iskakbayev ◽  
◽  
Bagdat Teltayev ◽  
Rossi C. Oliviero ◽  
K. Estayev ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document