Synthesis of Cu doped TiN composite films deposited by pulsed bias arc ion plating

Author(s):  
L. Zhang ◽  
G.J. Ma ◽  
G.Q. Lin ◽  
K.C. Han ◽  
H. Ma
2010 ◽  
Vol 25 (5) ◽  
pp. 517-521 ◽  
Author(s):  
Hong-Kai LI ◽  
Guo-Qiang LIN ◽  
Chuang DONG

2013 ◽  
Vol 364 ◽  
pp. 721-726
Author(s):  
Yan Zhang ◽  
Yuan Gao ◽  
Wei Qin Wu ◽  
Lin Yuan ◽  
Cheng Lei Wang ◽  
...  

In this study, the (Ti,Cr)N composite films were deposited on 4Cr13 martensitic stainless steel by multi-arc ion plating (MAIP), researched the composition, morphology and micro-hardness of (Ti,Cr)N composite films by the method of changing the current of Cr target and Ti target. The result show that: with the acr current increasing, the Cr content of (Ti,Cr)N composite films increased, the Ti content decreased, the number and size of droplets decreased, and the hardness of composite films increased first, then decreased. When the acr current was 70A, the hardness reached the maximum. At the same time, the phases of composite films changed when the Cr content increased. When the value of X was 0.28, the phase of composite was TiN and when the value of X was 0.37 or 0.65, the composite films appeared the phase of CrN and Cr2N.


Vacuum ◽  
2021 ◽  
pp. 110152
Author(s):  
Lijun Xian ◽  
Haibo Zhao ◽  
Guang Xian ◽  
Chencheng Wang ◽  
Hong He

Rare Metals ◽  
2016 ◽  
Vol 36 (11) ◽  
pp. 858-864 ◽  
Author(s):  
Jin-Long Li ◽  
Gang-Yi Cai ◽  
Hua-Sheng Zhong ◽  
Yong-Xin Wang ◽  
Jian-Min Chen

2011 ◽  
Vol 306-307 ◽  
pp. 274-279
Author(s):  
Qing Tao ◽  
Yan Wei Sui ◽  
Sun Zhi ◽  
Wei Song

AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the preparation of nitride thin films by using the arc ion plating has not been a systematic and deep study. The article presents our research procedure which the AlN and TiN thin films are deposited on stainless steel substrate by arc ion plating (AIP). The characteristics of thin films, for example microstructure, morphology, composition analysis and hardness, are examined and analyzed. The results showed that: Droplet-like particles appear in the microstructure of nitride thin films, and the grain size of droplet-like particles in AlN thin films is greater than in TiN thin films. The micro-hardness of nitride films preparation in experiment has improved significantly, and establish firmly basic for extending the application field of nitride film.


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