Assessment of interfacial layer thickness of pulsed laser deposited plasmonic copper thin films via spectroscopic ellipsometer

AbstractBi2(Zn1/3Ta2/3)2O7 (BZT) thin films were grown on the (111) oriented Pt/TiOx/SiO2/Si substrates using a pulsed laser deposition (PLD) technique. BZT thin films deposited at an oxygen partial pressure of 400 mTorr have the non-stoichiometric anomalous cubic phase despite the BZT target was the monoclinic phase. Compositions, the lattice mismatch, the interfacial layer and the residual stress in the film were investigated as the factors which may affect the formation of the anomalous cubic phase. Among them, the coherent interfacial layer which formed at high oxygen pressures resulted in the formation of the cubic phase by reducing the internal stress.

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Temperature dependence of magnetic and magnetotransport properties in BiFeO3 thin films by pulsed laser deposition

MRS Proceedings ◽

10.1557/opl.2014.147 ◽

2014 ◽

Vol 1636 ◽

Author(s):

P. Tiberto ◽

G. Barrera ◽

F. Celegato ◽

M. Coïsson ◽

P. Rizzi ◽

...

Keyword(s):

Thin Films ◽

Magnetic Properties ◽

Temperature Dependence ◽

Pulsed Laser Deposition ◽

Layer Thickness ◽

Room Temperature ◽

Pulsed Laser ◽

Laser Deposition ◽

Bifeo3 Thin Films ◽

Hard Magnetic Properties

ABSTRACTMultiferroic BFO/SRO/Si trilayers have been prepared by pulsed laser deposition in the form of thin films. As a function of the BFO layer thickness, magnetic and magneto-transport properties have been investigated at room temperature and down to 5 K. At low BFO layer thickness, a residual γ-Fe2O3 phase, which interacts interfacially with the SRO and BFO layers, is responsible for moderately hard magnetic properties of the film. On increasing BFO layer thickness, more homogeneous deposits are obtained with uniform magnetic and magneto-resistive properties.

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Experimental determination of interfacial-layer thickness from polarization-voltage hysteresis loops in Pb(Zr0.4Ti0.6)O3 thin films

Applied Physics Letters ◽

10.1063/1.1927270 ◽

2005 ◽

Vol 86 (20) ◽

pp. 202904 ◽

Cited By ~ 16

Author(s):

A. Q. Jiang ◽

C. Wang ◽

B. L. Cheng ◽

Z. H. Chen

Keyword(s):

Thin Films ◽

Experimental Determination ◽

Layer Thickness ◽

Interfacial Layer ◽

Hysteresis Loops ◽

Polarization Voltage ◽

Voltage Hysteresis

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The effect of Mg0.1Zn0.9O layer thickness on optical band gap of ZnO/Mg0.1Zn0.9O nano-scale multilayer thin films prepared by pulsed laser deposition method

Thin Solid Films ◽

10.1016/j.tsf.2011.02.010 ◽

2011 ◽

Vol 519 (13) ◽

pp. 4282-4285 ◽

Cited By ~ 9

Author(s):

Ja Young Cho ◽

Seung Wook Shin ◽

Ye Bin Kwon ◽

Hyun-Ki Lee ◽

Kyu Ung Sim ◽

...

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Band Gap ◽

Layer Thickness ◽

Optical Band Gap ◽

Pulsed Laser ◽

Laser Deposition ◽

Multilayer Thin Films ◽

Deposition Method ◽

Nano Scale

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Influence of Substrates on the Crystal Structure of Pulsed Laser Deposited Pb(Mg1/3Nb2/3)O3–29% PbTiO3 Thin Films

Journal of Materials Research ◽

10.1557/jmr.2002.0152 ◽

2002 ◽

Vol 17 (5) ◽

pp. 1030-1034 ◽

Cited By ~ 3

Author(s):

Jung-Kun Lee ◽

Hyun-Suk Jung ◽

Dong-Wan Kim ◽

Chang-Hoon Kim ◽

Kug Sun Hong

Keyword(s):

Thin Films ◽

Interfacial Layer ◽

Pyrochlore Phase ◽

Pulsed Laser ◽

Phase Evolution ◽

Si Substrate ◽

Oxide Electrodes ◽

Scanning Auger Microprobe ◽

Oxide Substrates ◽

Evolution Behavior

Lead magnesium niobate–lead titanate [Pb(Mg1/3Nb2/3)O3 (PMN)–PbTiO3 (PT)] films were synthesized using pulsed laser deposition, and the effect of substrates on the deposition behavior of the PMN–PT film was investigated. Phase evolution of PMN–PT thin films was found to depend significantly on the type of the substrate used during deposition. Though a mixture of pyrochlore and perovskite was observed when films were deposited on a Pt/TiO2/SiO2/Si substrate, the oxide substrates, such as (Ba0.5Sr0.5)RuO3/Si, SrTiO3, and LaAlO3, enabled the deposition of pure perovskite. Scanning Auger microprobe, transmission electron microscope, and x-ray diffraction analysis showed that an interfacial layer between the substrates and the oxide film was central to the phase evolution behavior. On the Pt/TiO2/SiO2/Si substrate, an interfacial layer of lead–platinum (Pb–Pt) played a major role in the formation of the pyrochlore phase. However, on oxide substrates, there was no interfacial layer and interdiffusion of A-site cations was observed between the PMN film and the oxide electrodes.

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Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100089652 ◽

1991 ◽

Vol 49 ◽

pp. 1068-1069

Author(s):

M. Grant Norton ◽

C. Barry Carter

Keyword(s):

Thin Film ◽

Thin Films ◽

Laser Ablation ◽

Substrate Surface ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Thin Film Deposition ◽

Film Deposition ◽

Laser Ablation Process ◽

Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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TEM sample preparation of wear-tested room-temperature pulsed-laser-deposited thin films of MoS2 by ultramicrotomy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100151428 ◽

1993 ◽

Vol 51 ◽

pp. 1118-1119

Author(s):

Pamela F. Lloyd ◽

Scott D. Walck

Keyword(s):

Thin Films ◽

Sample Preparation ◽

Room Temperature ◽

High Vacuum ◽

Pulsed Laser ◽

Ultra High Vacuum ◽

Wear Testing ◽

Preparation Technique ◽

Cross Sectional ◽

Aerospace Applications

Pulsed laser deposition (PLD) is a novel technique for the deposition of tribological thin films. MoS2 is the archetypical solid lubricant material for aerospace applications. It provides a low coefficient of friction from cryogenic temperatures to about 350°C and can be used in ultra high vacuum environments. The TEM is ideally suited for studying the microstructural and tribo-chemical changes that occur during wear. The normal cross sectional TEM sample preparation method does not work well because the material’s lubricity causes the sandwich to separate. Walck et al. deposited MoS2 through a mesh mask which gave suitable results for as-deposited films, but the discontinuous nature of the film is unsuitable for wear-testing. To investigate wear-tested, room temperature (RT) PLD MoS2 films, the sample preparation technique of Heuer and Howitt was adapted.Two 300 run thick films were deposited on single crystal NaCl substrates. One was wear-tested on a ball-on-disk tribometer using a 30 gm load at 150 rpm for one minute, and subsequently coated with a heavy layer of evaporated gold.

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