X-ray reflectivity studies of ferroelectric and dielectric multilayer structures

2005 ◽  
Vol 357 (1-2) ◽  
pp. 122-125 ◽  
Author(s):  
Jiang-Li Cao ◽  
Axel Solbach ◽  
Uwe Klemradt
Keyword(s):  
Multilayer Structures ◽  
X Ray ◽  
Dielectric Multilayer

Aperiodic multilayer structures in soft X-ray optics

2015 ◽  
Vol 185 (11) ◽  
pp. 1203-1214 ◽  
Author(s):  
Aleksandr S. Pirozhkov ◽  
Evgenii N. Ragozin
Keyword(s):  
Multilayer Structures ◽  
Ray Optics ◽  
X Ray

Aperiodic multilayer structures in soft X-ray optics

2015 ◽  
Vol 58 (11) ◽  
pp. 1095-1105 ◽  
Author(s):  
A S Pirozhkov ◽  
E N Ragozin
Keyword(s):  
Multilayer Structures ◽  
Ray Optics ◽  
X Ray

Composition determination in InGaAs/InP multilayer structures by X-ray microanalysis in a STEM

2020 ◽  
pp. 649-654
Author(s):  
J N Chapman ◽  
A J McGibbon ◽  
A G Cullis ◽  
N G Chew ◽  
S J Bass ◽  
...  
Keyword(s):  
Multilayer Structures ◽  
X Ray ◽  
Composition Determination

Fano resonances in near-field absorption in all-dielectric multilayer structures

2018 ◽  
Vol 20 (12) ◽  
pp. 125003 ◽  
Author(s):  
Byungjun Kang ◽  
Minoru Fujii ◽  
Dmitry V Nesterenko ◽  
Zouheir Sekkat ◽  
Shinji Hayashi
Keyword(s):  
Near Field ◽  
Multilayer Structures ◽  
Fano Resonances ◽  
Dielectric Multilayer

A setup for probing ultra-short soft X-ray diffraction by means of curved multilayer structures

2011 ◽  
Vol 269 (19) ◽  
pp. 2124-2129
Author(s):  
D. Ksenzov ◽  
Ch. Schlemper ◽  
A. Davtyan ◽  
S. Bajt ◽  
F. Schäfers ◽  
...  
Keyword(s):  
Multilayer Structures ◽  
X Ray Diffraction ◽  
X Ray

scholarly journals Assessment of Potential of the High-Voltage Anodic Plasma Source to Deposit Multilayer Structures Relevant to X-ray Mirror Applications

Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 531
Author(s):  
Aurel-Mihai Vlaicu ◽  
Alexandru Anghel ◽  
Marius Badulescu ◽  
Cristina Surdu-Bob
Keyword(s):  
Film Thickness ◽  
Layer Thickness ◽  
Deposition Rate ◽  
High Voltage ◽  
Plasma Source ◽  
Multilayer Structures ◽  
Deposition Technique ◽  
X Ray ◽  
Coating Technique ◽  
Glass Substrates

(1) Background: The high-voltage anodic-plasma (HVAP) coating technique has a series of specificities that are not simultaneously met in other deposition methods. This paper aimed at assessing the potential of HVAP to synthesize quality multilayers for X-ray optics. (2) Methods: Nanolayers of W, Ta, B, and Si were deposited as mono-, bi-, and multilayers onto very smooth glass substrates by HVAP, and their thickness and density were analyzed by X-ray reflectometry. The minimal film thickness needed to obtain continuous nanolayers was also investigated. (3) Results: Nanolayer roughness did not increase with layer thickness, and could be lowered via deposition rate, with values as low as 0.6 for the W nanolayer. Minimal film thickness for continuous films for the studied metals was 4 nm (W), 6 nm (Ta), 2.5 nm (B), and 6 nm (Si). (4) Conclusions: The investigation revealed the range of parameters to be used for obtaining quality nanolayers and multilayers by HVAP. Advantages and possible improvements are discussed. This deposition technique can be tailored for demanding applications such as X-ray mirrors.

Wave scattering by metal-dielectric multilayer structures with gain

JETP Letters ◽  
2015 ◽  
Vol 100 (11) ◽  
pp. 731-736 ◽  
Author(s):  
R. S. Savelev ◽  
I. V. Shadrivov ◽  
Yu. S. Kivshar
Keyword(s):  
Wave Scattering ◽  
Multilayer Structures ◽  
Dielectric Multilayer

scholarly journals Microstructure and Stability Comparison of Nanometer Period W/C, Wc/C, and Ru/C Multilayer Structures

1990 ◽  
Vol 187 ◽  
Author(s):  
Tai D. Nguyen ◽  
Ronald Gronsky ◽  
Jeffrey B. Kortright
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Layered Structures ◽  
Multilayer Structures ◽  
X Ray ◽  
Transmission Electron

AbstractMultilayer structures of W/C, WC/C, and Ru/C, of various periods were prepared and studied by high-resolution transmission electron microscopy. Comparison of the phases in the layered structures is made for as-prepared and annealed samples. Both as-prepared and annealed WC/C multilayers are predominantly amorphous, while the phases in the W/C depend on the periods. The 2 nm period W/C multilayer remains amorphous after annealing, and the longer periods recrystallize to form W2C. The layered microstructures of W/C and WC/C are stable on annealing at all periods, while the amorphous Ru-rich layers in the 2 nm period Ru/C multilayer agglomerate upon annealing to form elemental hexagonal Ru crystallites. Larger period Ru/C multilayers show stable layered structures, and indicate hexagonal Ru in the Ru-rich layers. X-ray measurements show that the multilayer periods expand on annealing for all metal-carbon multilayers studied.

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