Microstructural characterization of high-quality indium tin oxide films deposited by thermionically enhanced magnetron sputtering at low temperature

Vacuum ◽  
2014 ◽  
Vol 107 ◽  
pp. 56-61 ◽  
Author(s):  
Ying-Feng Lan ◽  
Ying-Hung Chen ◽  
Ju-Liang He ◽  
Jing-Tang Chang
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Microstructural Characterization ◽  
High Quality ◽  
Tin Oxide Films

Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films
Sign in / Sign up

Export Citation Format

Share Document